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机译:旋转圆柱磁控管溅射:反应过程的仿真
Department of Solid State Sciences, Research Group DRAFT, Ghent University, Krijgslaan 281 (S1), 9000 Gent, Belgium;
rnDepartment of Physics, Taiyuan University of Technology, 030024 Taiyuan, People's Republic of China;
rnDepartment of Solid State Sciences, Research Group DRAFT, Ghent University, Krijgslaan 281 (S1), 9000 Gent, Belgium;
rnDepartment of Solid State Sciences, Research Group DRAFT, Ghent University, Krijgslaan 281 (S1), 9000 Gent, Belgium;
rnDepartment of Solid State Sciences, Research Group DRAFT, Ghent University, Krijgslaan 281 (S1), 9000 Gent, Belgium;
rnDepartment of Solid State Sciences, Research Group DRAFT, Ghent University, Krijgslaan 281 (S1), 9000 Gent, Belgium;
rnDepartment of Solid State Sciences, Research Group DRAFT, Ghent University, Krijgslaan 281 (S1), 9000 Gent, Belgium;
rnDepartment of Chemistry, Research Group PLASMANT, University of Antwerp, Universiteitsplein 1, 2610 Wilrijk-Antwerp, Belgium;
机译:旋转圆柱磁控溅射过程中沉积物对反应溅射行为的影响
机译:溅射功率对带有旋转圆柱靶的脉冲直流磁控溅射沉积的ZnO:Ga透明导电氧化物膜性能的影响
机译:反应性直流磁控溅射溅射沉积铌钛氮化物的过程模拟
机译:用于屏障和等离子体聚合应用的无功旋转圆柱形磁控溅射
机译:在高温“智能”摩擦应用中,在封闭场不平衡磁控溅射中反应性沉积的氮化铝压电薄膜。
机译:溶胶-凝胶法和磁控反应溅射制备Eu掺杂ZnO薄膜的结构性能与能量转移的相关性
机译:旋转圆柱形磁控溅射过程中目标中的惰性气体保留(第93卷,第061501号,2008年)