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机译:TiO_2沉积温度对PbO气相反应溅射生长PbTiO_3薄膜压电性能的影响
Department of Materials Science and Engineering, KAIST, Daejeon 305-701, Republic of Korea;
Materials Science Division, Argonne National Laboratory, Lemont, Illinois 60439, USA;
Physics, Imperial College, London SW7 2AZ, United Kingdom;
Department of Materials Science and Engineering, KAIST, Daejeon 305-701, Republic of Korea;
Department of Materials Science and Engineering, KAIST, Daejeon 305-701, Republic of Korea;
Semiconductor R&D Center, Samsung Electronics Co., Yongin 446-711, Republic of Korea;
Department of Materials Science and Engineering, KAIST, Daejeon 305-701, Republic of Korea;
机译:低温反应溅射生长GaN薄膜的性能和沉积工艺
机译:高压反应溅射和原子层沉积生长TiO_2薄膜电性能的比较研究
机译:溅射生长的低温稳定的金红石相TiO_2薄膜
机译:通过RF磁控溅射在室温下生长的TiO_2薄膜的锐钛矿,金红石和无定形阶段的光学性质
机译:TiO_2薄膜的反应溅射沉积工艺分析参见用法统计
机译:原子层沉积生长La2O3薄膜的膜厚和退火温度表征结构性能。
机译:低温反应溅射生长GaN薄膜的性能和沉积工艺