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首页> 外文期刊>Journal of Applied Physics >Effect of deposition temperature of TiO_2 on the piezoelectric property of PbTiO_3 film grown by PbO gas phase reaction sputtering
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Effect of deposition temperature of TiO_2 on the piezoelectric property of PbTiO_3 film grown by PbO gas phase reaction sputtering

机译:TiO_2沉积温度对PbO气相反应溅射生长PbTiO_3薄膜压电性能的影响

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摘要

A 17 nm thick PbTiO_3 (PTO) films were fabricated via PbO gas phase reaction with TiO_2 starting layer in a sputtering chamber. The influence of deposition temperature of TiO_2 on the piezoelectric properties of PTO thin films was investigated. The remnant piezoresponse of PTO films nonlinearly increased as a function of TiO_2 deposition temperature, which is correlated with the increase in average grain diameter of PTO film. As grain size increases, the restriction on remnant piezoresponse imposed by the grain boundary via coupling between local strain and polarization becomes less pronounced, which results in the increase in remnant piezoresponse. Furthermore, we found that the vertical shift in piezoresponse hysteresis loops is closely related to the residual stress state. A strong correlation between the negative vertical shift and the residual tensile stress reveals that residual stress on the resulting PTO film contributed to the asymmetric piezoelectric property.
机译:通过在溅射室中与TiO_2起始层进行PbO气相反应,制备了17 nm厚的PbTiO_3(PTO)膜。研究了TiO_2沉积温度对PTO薄膜压电性能的影响。 PTO薄膜的残余压电响应随TiO_2沉积温度的增加而非线性增加,这与PTO薄膜平均粒径的增加有关。随着晶粒尺寸的增加,由晶界通过局部应变和极化之间的耦合施加的对残余压电响应的限制变得不太明显,这导致残余压电响应的增加。此外,我们发现压电响应磁滞回线的垂直位移与残余应力状态密切相关。负垂直位移和残余拉应力之间的强相关性表明,所得PTO膜上的残余应力有助于非对称压电性能。

著录项

  • 来源
    《Journal of Applied Physics》 |2010年第10期|P.104112.1-104112.5|共5页
  • 作者单位

    Department of Materials Science and Engineering, KAIST, Daejeon 305-701, Republic of Korea;

    Materials Science Division, Argonne National Laboratory, Lemont, Illinois 60439, USA;

    Physics, Imperial College, London SW7 2AZ, United Kingdom;

    Department of Materials Science and Engineering, KAIST, Daejeon 305-701, Republic of Korea;

    Department of Materials Science and Engineering, KAIST, Daejeon 305-701, Republic of Korea;

    Semiconductor R&D Center, Samsung Electronics Co., Yongin 446-711, Republic of Korea;

    Department of Materials Science and Engineering, KAIST, Daejeon 305-701, Republic of Korea;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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