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首页> 外文期刊>Journal of Applied Physics >Effect of RuCoCr-oxide intermediate layers on the growth, microstructure,and recording performance of CoCrPt-SiO_2 perpendicular recording media
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Effect of RuCoCr-oxide intermediate layers on the growth, microstructure,and recording performance of CoCrPt-SiO_2 perpendicular recording media

机译:RuCoCr-氧化物中间层对CoCrPt-SiO_2垂直记录介质的生长,微观结构和记录性能的影响

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摘要

The crystallographic growth, magnetic properties, microstructure, and recording performance of CoCrPt-SiO_2 perpendicular magnetic recording media on RuCoCr type of intermediate layers were systematically investigated. Excellent Co (00·2) crystallographic texture with dispersion △θ_(50) as low as 3.2° could be obtained on the RuCoCr as the grain isolation layer, whereas the △θ_(50) on the pure Ru grain isolation layer was 3.9°. Upon injecting oxygen into the RuCoCr layer via reactive sputtering and at high sputter pressures, grain center-to-center distance as small as 5.9 nm with a distribution of about 13% was achieved. The △θ_(50) deteriorated on the RuCoCr-oxide type of intermediate layers, however, it remained comparable to that on the pure Ru layers. Signal-to-noise ratio also increased on the RuCoCr-oxide grain isolation layers due to the decreased grain sizes. The effectiveness of the RuCoCr-oxide type of intermediate layers toward grain size reduction and in improving the performance of perpendicular magnetic recording media is discussed.
机译:系统研究了CoCrPt-SiO_2垂直磁记录介质在RuCoCr型中间层上的晶体生长,磁性能,微观结构和记录性能。在作为晶粒隔离层的RuCoCr上可获得出色的Co(00·2)晶体织构,色散△θ_(50)低至3.2°,而纯Ru晶粒隔离层的△θ_(50)为3.9° 。通过反应性溅射并在高溅射压力下向RuCoCr层中注入氧气后,晶粒中心距达到了5.9 nm,分布约为13%。 Δθ_(50)在RuCoCr-氧化物类型的中间层上变差,但是仍然与纯Ru层上的相当。由于晶粒尺寸减小,RuCoCr-氧化物晶粒隔离层的信噪比也增加了。讨论了RuCoCr-氧化物类型的中间层对减小晶粒尺寸和改善垂直磁记录介质性能的有效性。

著录项

  • 来源
    《Journal of Applied Physics》 |2010年第3期|033901.1-033901.6|共6页
  • 作者单位

    Data Storage Institute, (A~*STAR) Agency for Science, Technology and Research, 5 Engineering Drive I,Singapore 117608, Singapore;

    Data Storage Institute, (A~*STAR) Agency for Science, Technology and Research, 5 Engineering Drive I,Singapore 117608, Singapore;

    Data Storage Institute, (A~*STAR) Agency for Science, Technology and Research, 5 Engineering Drive I,Singapore 117608, Singapore;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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