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A comparative study of the electrical properties of Pd/ZnO Schottky contacts fabricated using electron beam deposition and resistive/thermal evaporation techniques

机译:电子束沉积和电阻/热蒸发技术制备的Pd / ZnO肖特基接触点电性能的比较研究

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摘要

A systematic investigation to check the quality of Pd Schottky contacts deposited on ZnO has been performed on electron beam (e-beam) deposited and resistively/thermally evaporated samples using current-voltage, IV, and conventional deep level transient spectroscopy (DLTS) measurements. Room temperature IV measurements reveal the dominance of pure thermionic emission on the resistively evaporated contacts, while the e-beam deposited contacts show the dominance of generation recombination at low voltages, <0.30 V, and the dominance of pure thermionic emission at high voltages, greater than 0.30 V. The resistively evaporated contacts have very low reverse currents of the order of 10~(10) A at a reverse voltage of 1.0 V whereas the e-beam deposited contacts have reverse currents of the order of 10~(-6) A at 1.0 V. Average ideality factors have been determined as (1.43 ± 0.01) and (1.66 ± 0.02) for the resistively evaporated contacts and e-beam deposited contacts, respectively. The IV barrier heights have been calculated as (0.721 ±0.002) Ev and (0.624 ± 0.005) Ev for the resistively evaporated and e-beam deposited contacts, respectively. Conventional DLTS measurements reveal the presence of three prominent defects in both the resistive and e-beam contacts. Two extra peaks with energy levels of 0.60 and 0.81 Ev below the conduction band minimum have been observed' in the e-beam deposited contacts. These have been explained as contributing to the generation recombination current that dominates at low voltages and high leakage currents. Based on the reverse current at 1.0 V, the degree of rectification, the dominant current transport mechanism and the observed defects, we conclude that the resistive evaporation technique yields better quality Schottky contacts for use in solar cells and ultraviolet detectors compared to the e-beam deposition technique. The 0.60 Ev has been identified as possibly related to the unoccupied level for the doubly charged oxygen vacancy, V_O~(2+).
机译:已经使用电流-电压,IV和常规深电平瞬变光谱(DLTS)测量对电子束(e-beam)沉积和电阻/热蒸发的样品进行了系统检查,以检查ZnO上沉积的Pd肖特基接触的质量。室温IV测量显示在电阻蒸发的触点上纯热电子发射的优势,而电子束沉积的触点在<0.30 V的低电压下显示出重组产生的优势,而在高压下纯热电子发射的优势更大。电阻蒸发的触点在1.0 V的反向电压下具有非常低的10〜(10)A的反向电流,而电子束沉积触点的反向电流则在10〜(-6)的数量级。 A在1.0 V时。电阻蒸发触点和电子束沉积触点的平均理想因子分别确定为(1.43±0.01)和(1.66±0.02)。对于电阻蒸发和电子束沉积触点,IV势垒高度的计算值分别为(0.721±0.002)Ev和(0.624±0.005)Ev。常规的DLTS测量揭示了电阻性和电子束接触中都存在三个突出的缺陷。在电子束沉积触点中观察到两个额外的峰,它们的能级分别低于导带最小值0.60和0.81 Ev。这些已被解释为有助于在低电压和高泄漏电流下占主导地位的发电复合电流。基于1.0 V的反向电流,整流程度,主导的电流传输机制和观察到的缺陷,我们得出的结论是,与电子束相比,电阻蒸发技术可产生用于太阳能电池和紫外线探测器的质量更好的肖特基接触沉积技术。已经确定0.60 Ev可能与双电荷氧空位V_O〜(2+)的未占用水平有关。

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  • 来源
    《Journal of Applied Physics》 |2011年第9期|p.094504.1-094504.5|共5页
  • 作者单位

    Department of Physics, University of Pretoria, Private Bag X20, Hatfield, 0028, South Africa;

    Department of Physics, University of Pretoria, Private Bag X20, Hatfield, 0028, South Africa;

    Department of Physics, University of Pretoria, Private Bag X20, Hatfield, 0028, South Africa;

    Department of Physics, University of Pretoria, Private Bag X20, Hatfield, 0028, South Africa;

    Department of Physics, University of Pretoria, Private Bag X20, Hatfield, 0028, South Africa;

    Department of Physics, University of Pretoria, Private Bag X20, Hatfield, 0028, South Africa;

    Department of Physics, University of Pretoria, Private Bag X20, Hatfield, 0028, South Africa;

    Department of Physics, University of Pretoria, Private Bag X20, Hatfield, 0028, South Africa;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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