Surface roughness of MgO thin film and its critical thickness for optimal biaxial texturing by ion-beam-assisted deposition

摘要

We investigated the deposition time dependences of the in-plane grain alignment (Ac/)) and the surface roughness (w) of biaxially textured MgO thin films fabricated by ion-beam-assisted deposition (IBAD) and found a strong correlation between them. The time evolution of the surface roughness of IBAD-MgO showed an abrupt increase at the same time corresponding to the beginning of the deterioration in Δφ. The roughness versus thickness profiles obtained under different deposition conditions with different assisting ion-beam currents collapsed to a single curve, even though the deposition rates were significantly different in each condition. This implies that the abrupt increase in roughness occurred at the same thickness-of about 4 nm-irrespective of the deposition rate. The result also indicated that the Δφ deterioration began with the same thickness of about 4 nm. This "critical" thickness of about 4 nm might be related to the completion of the crystallization of the film. Further, deposition beyond the critical thickness, therefore, became merely a homoepitaxial deposition under the "IBAD" condition, which was far from optimal because of the ion bombardment and low temperature (no-heating), and thus Δφ deteriorated. Based on these considerations, we propose an approach to attain a sharp texture in a IBAD-MgO-based biaxial substrate; moreover, we demonstrated this approach using a two-step deposition process.