机译:短周期原子层沉积HfO_2 / AI_2O_3多层膜的粗糙度演化和层堆积缺陷的研究
Laboratorio Nacional de Luz Sincrotron, Caixa Postal 6192 - CEP 13083-970, Campinas, SP, Brazil,Instituto de Fisica Gleb Wataghin - Universidade Estadual de Campinas - CEP 13083-859, Campinas,SP, Brazil;
Laboratorio Nacional de Luz Sincrotron, Caixa Postal 6192 - CEP 13083-970, Campinas, SP, Brazil;
Laboratorio Nacional de Luz Sincrotron, Caixa Postal 6192 - CEP 13083-970, Campinas, SP, Brazil;
Laboratorio Nacional de Luz Sincrotron, Caixa Postal 6192 - CEP 13083-970, Campinas, SP, Brazil;
Laboratorio Nacional de Luz Sincrotron, Caixa Postal 6192 - CEP 13083-970, Campinas, SP, Brazil;
Department of Material Science, Fudan University, 220 Handan Road, Shanghai 200433,People's Republic of China,Institute for Integrative Nanosciences, IFW Dresden, Helmholtzstr. 20, D-01069 Dresden, Germany;
Department of Material Science, Fudan University, 220 Handan Road, Shanghai 200433,People's Republic of China,Institute for Integrative Nanosciences, IFW Dresden, Helmholtzstr. 20, D-01069 Dresden, Germany;
Institute for Integrative Nanosciences, IFW Dresden, Helmholtzstr. 20, D-01069 Dresden, Germany;
机译:X射线光电子能谱研究InAIAs与原子层沉积HfO_2 / AI_2O_3之间的能带对准
机译:通过内部光发射和光谱椭圆光度法测定InP上原子层沉积的AI_2O_3和HfO_2的能带偏移
机译:原子层沉积的HfO_2 / ZrO_2纳米层堆叠中的电阻转换
机译:工艺条件对原子层沉积的AI_2O_3和HfO_2薄膜电学特性的影响
机译:沉积在Ag(100)上的亚单层和多层Ag膜的扫描隧道显微镜研究(银膜,动力学粗糙化,均质性)。
机译:ALD沉积La2O3 / Al2O3叠层和LaAlO3介电薄膜的电学性能研究
机译:ALD沉积La2O3 / Al2O3叠层和LaAlO3介电薄膜的电学性能研究
机译:4H-siC同质外延层堆垛层错特性的阴极发光研究