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Numerical failure analysis of current-confined-path current perpendicular-to-plane giant magnetoresistance spin-valve read sensors under high current density

机译:高电流密度下电流限制路径电流垂直平面巨磁阻自旋阀读取传感器的数值失效分析

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摘要

Thermomigration (TM)-induced failures occurred in the current-confined-path (CCP) current perpendicular-to-the plane (CPP) giant magnetoresistance spin valve (GMR SV) read sensors with Cu nanopillar metal paths (~5 nm in diameter) operating at a high current density (J > 2 × 10~7 A/cm~2) have been numerically studied to explore the magnetic and electrical stability. The Cu interdiffusion (migration) from nanopillars into adjacent magnetic layers (e.g., CoFe) due to thermally induced mass transport was found to be the main physical reason for the magnetic failures of CCP-CPP GMR SV read sensors including the change in interlayer coupling and the reduction in exchange bias field as well as MR. Furthermore, it was numerically verified that the TM-induced failures are more dominant than the electromigration-induced failures at the higher current density beyond J = 6 × 10~7 A/cm~2 in the CCP-CPP GMR SV read sensors. However, all the numerical calculation results demonstrated in this study clearly suggest that these undesirable electrical and magnetic failures occurred in the CCP-CPP GMR SV read sensors can be improved by tuning the path density, the purity (electrical resistivity), and the uniformity of Cu nanopillar metal paths.
机译:热迁移(TM)引起的故障发生在垂直于平面(CPP)的大电流磁阻自旋阀(GMR SV)读取具有铜纳米柱金属路径(直径约5 nm)的传感器中已经对在高电流密度(J> 2×10〜7 A / cm〜2)下工作的电磁场进行了数值研究,以探索其磁和电稳定性。发现由于热诱导的质量迁移,纳米柱中的铜相互扩散(迁移)到相邻的磁性层(例如CoFe)是造成CCP-CPP GMR SV读取传感器发生磁故障的主要原因的物理原因,包括层间耦合和交换偏置场和MR的减小。此外,在数值上验证了在CCP-CPP GMR SV读取传感器中,在J = 6×10〜7 A / cm〜2的更高电流密度下,TM引起的故障比电迁移引起的故障更为明显。但是,本研究中证明的所有数值计算结果清楚地表明,通过调整路径密度,纯度(电阻率)和均匀性,可以改善CCP-CPP GMR SV读取传感器中发生的这些不良的电磁故障。铜纳米柱金属路径。

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  • 来源
    《Journal of Applied Physics》 |2011年第3期|p.373-379|共7页
  • 作者单位

    Department of Electrical and Computer Engineering, Biomagnetics Laboratory (BML),National University of Singapore, 117576 Singapore;

    Daion Co. Ltd., Incheon 405-846, South Korea;

    Department of Electronic Materials Engineering, Kwangwoon University, Seoul 139-701, South Korea;

    Department of Electrical and Computer Engineering, Biomagnetics Laboratory (BML),National University of Singapore, 117576 Singapore;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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