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A comparative study of TiN and TiC: Oxidation resistance and retention of xenon at high temperature and under degraded vacuum

机译:TiN和TiC的比较研究:高温和真空下的耐氧化性和氙的保留

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摘要

Dense TiN and TiC samples were prepared by hot pressing using micrometric powders. Xenon species (simulating rare gas fission products) were then implanted into the ceramics. The samples were annealed for 1 h at 1500 ℃ under several degraded vacuums with P_O_2 varying from 10~(-6) to 2 × 10~(-4) mbars. The oxidation resistance of the samples and their retention properties with respect to preimplanted xenon species were analyzed using scanning electron microscopy, grazing incidence x-ray diffraction, Rutherford backscattering spectrometry, and nuclear backscattering spectrometry. Results indicate that TiC is resistant to oxidation and does not release xenon for P_O_2 ≤ 6 × 10~(-6) mbars. When P_O_2 increases, geometric oxide crystallites appear at the surface depending on the orientation and size of TiC grains. These oxide phases are Ti_2O_3, Ti_3O_5, and TiO_2. Apparition of oxide crystallites is associated with the beginning of xenon release. TiC surface is completely covered by the oxide phases at P_O_2=2 × 10~(-4) mbars up to a depth of 3 μm and the xenon is then completely released. For TiN samples, the results show a progressive apparition of oxide crystallites (Ti_3O_5 mainly) at the surface when P_O_2 increases. The presence of the oxide crystallites is also directly correlated with xenon release, the more oxide crystallites are growing the more xenon is released. TiN surface, is completely covered by an oxide layer at P_O_2 =2 × 10~(-4) mbars up to 1 μm. A correlation between the initial fine microstructure of TiN and the properties of the growing layer is suggested.
机译:使用微米级粉末通过热压制备致密的TiN和TiC样品。然后将氙物质(模拟稀有气体裂变产物)植入陶瓷中。样品在几个退化的真空下于1500℃退火1 h,P_O_2从10〜(-6)到2×10〜(-4)mbar。使用扫描电子显微镜,掠入射X射线衍射,卢瑟福背散射光谱和核背散射光谱分析了样品的抗氧化性及其相对于预植入氙物种的保留性能。结果表明,对于P_O_2≤6×10〜(-6)mbar,TiC具有抗氧化性,不会释放氙气。当P_O_2增加时,根据TiC晶粒的取向和尺寸,几何氧化物微晶出现在表面。这些氧化物相是Ti_2O_3,Ti_3O_5和TiO_2。氧化物微晶的出现与氙气释放的开始有关。 TiC表面被P_O_2 = 2×10〜(-4)mbar处的氧化物相完全覆盖,直至3μm的深度,然后氙被完全释放。对于TiN样品,结果表明,当P_O_2增加时,氧化物微晶(主要是Ti_3O_5)在表面逐渐消失。氧化物微晶的存在也与氙的释放直接相关,生长的氧化物微晶越多,氙的释放就越多。 TiN表面完全被一层高达1μm的P_O_2 = 2×10〜(-4)mbar的氧化层覆盖。 TiN的初始细微结构与生长层的性能之间存在相关性。

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  • 来源
    《Journal of Applied Physics》 |2011年第1期|p.014906.1-014906.9|共9页
  • 作者单位

    Universite de Lyon, Universite Claude Bernard Lyon 1, CNRS/IN2P3, UMR5822, IPNL,69622 Villeurbanne Cedex, France;

    Universite de Lyon, Universite Claude Bernard Lyon 1, CNRS/IN2P3, UMR5822, IPNL,69622 Villeurbanne Cedex, France;

    Universite de Lyon, Universite Claude Bernard Lyon 1, CNRS/IN2P3, UMR5822, IPNL,69622 Villeurbanne Cedex, France;

    Universite de Lyon, INSA de Lyon, MATEIS, CNRS UMR 5510, 7 Avenue Jean Capelle,69621 Villeurbanne Cedex, France;

    Universite de Lyon, Universite Claude Bernard Lyon 1, CNRS/IN2P3, UMR5822, IPNL,69622 Villeurbanne Cedex, France;

    Universite de Lyon, Universite Claude Bernard Lyon 1, CNRS/IN2P3, UMR5822, IPNL,69622 Villeurbanne Cedex, France;

    Universite de Lyon, INSA de Lyon, MATEIS, CNRS UMR 5510, 7 Avenue Jean Capelle,69621 Villeurbanne Cedex, France;

    Universite de Lyon, Universite Claude Bernard Lyon 1, CNRS/IN2P3, UMR5822, IPNL,69622 Villeurbanne Cedex, France;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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