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首页> 外文期刊>Journal of Applied Physics >Probing interfacial charge accumulation in ITO/α-NPD/Alq_3/Al diodes under two electroluminescence operational modes by electric-field induced optical second-harmonic generation
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Probing interfacial charge accumulation in ITO/α-NPD/Alq_3/Al diodes under two electroluminescence operational modes by electric-field induced optical second-harmonic generation

机译:电场诱导的光二次谐波产生在两种电致发光工作模式下探测ITO /α-NPD/ Alq_3 / Al二极管中的界面电荷积累

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摘要

69%By using electric field induce4d optical second harmonic generation measurement, charge accumulation at the double-layer interface of ITO/α-NPD/Alq_3/Al diodes was verified under two electroluminescence (EL) operational modes, which were activated in the low and high frequency regions, respectively, with application of large ac square voltage. Results supported our proposed idea [A. Sadakata et al., J. Appl. Phys. 110, 103707 (2011)] that accumulated holes suppress hole injection in the low frequency region and lead to the decrease of the EL intensity activated by the recombination of holes and electrons injected from opposite electrodes. On the one hand, the accumulated holes assist electron injection in the high frequency region and result in the increase of EL intensity activated by the recombination of the interfacial accumulated holes and injected electrons from Al electrode.
机译:69%通过使用电场感应4d光学二次谐波生成测量,在两种电致发光(EL)工作模式下验证了ITO /α-NPD/ Alq_3 / Al二极管双层界面处的电荷积累,并在低和高频区域,分别施加较大的交流平方电压。结果支持了我们提出的想法[A. Sadakata等人,J.Appl.Chem。物理110,103707(2011)]中积累的空穴抑制了在低频区域中的空穴注入,并导致通过空穴和从相对电极注入的电子的复合而激活的EL强度的降低。一方面,累积的空穴有助于在高频区域中的电子注入,并导致界面累积的空穴和从Al电极注入的电子的复合而激活的EL强度的增加。

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  • 来源
    《Journal of Applied Physics》 |2012年第8期|083723.1-083723.8|共8页
  • 作者单位

    Department of Physical Electronics, Tokyo Institute of Technology, 2-12-1 S3-33 O-okayama, Meguro-ku, Tokyo 152-8552, Japan;

    Department of Physical Electronics, Tokyo Institute of Technology, 2-12-1 S3-33 O-okayama, Meguro-ku, Tokyo 152-8552, Japan;

    Department of Physical Electronics, Tokyo Institute of Technology, 2-12-1 S3-33 O-okayama, Meguro-ku, Tokyo 152-8552, Japan;

    Department of Physical Electronics, Tokyo Institute of Technology, 2-12-1 S3-33 O-okayama, Meguro-ku, Tokyo 152-8552, Japan;

    Department of Electrical Engineering and Information Technology, Kyushu Sangyo University, 2-3-1 Matsukadai, Higashi-ku, Fukuoka 813-8503, Japan;

    Department of Physical Electronics, Tokyo Institute of Technology, 2-12-1 S3-33 O-okayama, Meguro-ku, Tokyo 152-8552, Japan;

    Department of Physical Electronics, Tokyo Institute of Technology, 2-12-1 S3-33 O-okayama, Meguro-ku, Tokyo 152-8552, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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