首页> 外文期刊>Journal of Applied Physics >Electron spin resonance features of the Ge Pb1 dangling bond defect in condensation-grown (100)Si/SiO_2/Si_(1-x)Ge_x/SiO_2 heterostructures
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Electron spin resonance features of the Ge Pb1 dangling bond defect in condensation-grown (100)Si/SiO_2/Si_(1-x)Ge_x/SiO_2 heterostructures

机译:缩合生长(100)Si / SiO_2 / Si_(1-x)Ge_x / SiO_2异质结构中Ge Pb1悬空键缺陷的电子自旋共振特征

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摘要

A multi-frequency electron spin resonance (ESR) study has been carried out the Ge P_(b1) dangling bond (DB)-type interface defect in SiO_2/Si_(1-x)Ge_x/SiO_2 heterostructures of different Ge fraction manufactured by the condensation technique. The notable absence of Si Pb-type centers enables unobscured spectral analysis as function of magnetic field angle, reassured by coinciding multi-frequency ESR data. The center features monoclinic-I (C_(2v)) symmetry with principal g values g_1 = 2.0338 ± 0.0003, g_2 = 2.0386 ± 0.0006, g_3 = 2.0054, with the lowest value, g_3, axis 24 ± 2° off a (111) direction towards the [100] interface normal n. The defect appearance shows a systematic variation as function of x, reaching maximum densities of ~6.8 × 10~(12)cm~(-2) per Si/SiO_2 interface for x ~ 0.7, to disappear for x outside the ]0.45-0.87[ range. The ESR signal width is dominated by inhomogeneous broadening arising from strain-induced Gaussian spread in g, resulting in frequency (v)-dependent peak-to-peak broadening of △B_(pp)~(SB)/v = 0.62 G/GHz and 1.13 G/GHz for the applied magnetic field B//g_3 principal axis and B/, respectively. Compared to the familiar Si Pb-type interface defects in (100)Si/SiO_2, the enhanced (v-dependent broadening scales with the spin-orbit coupling constant ratio λ(Ge)/λ(Si). The natural inhomogeneous broadening due to unresolved ~(73)Ge hyperfine interaction is found to be below ~1.56G, the inferred residual (ν→0) width. The core of the defect, previously depicted as a Ge P_(b1)-type center, concerns an asymmetrically back bonded trivalent Ge atom where the total of all data would suggest a back bond arrangement involving two Ge and one Si atoms and/or a strained bond. Initial studies show the defect to exhibit reversal hydrogen passivation/depassivation kinetics, where defects can be substantially, yet only partially, ESR-inactivated by heating in H_2. The properties and nature of the center are discussed within the context of the their inherent incorporation as interface mismatch centers, where assessing the defect's nature and modalities of occurrence may provide a link to unraveling the role of point defects in adapting interfacial mismatch.
机译:进行了多频电子自旋共振(ESR)研究。冷凝技术。 Si Pb型中心的显着缺失使得能够根据磁场角进行清晰的频谱分析,并通过多频ESR数据重合来保证。中心具有单斜I(C_(2v))对称性,主要g值g_1 = 2.0338±0.0003,g_2 = 2.0386±0.0006,g_3 = 2.0054,最低值g_3,轴a(111)偏离24±2°朝向[100]接口法线的方向。缺陷外观表现出随x的系统变化,对于x〜0.7,每个Si / SiO_2界面的最大密度达到〜6.8×10〜(12)cm〜(-2),对于x在] 0.45-0.87之外消失。 [ 范围。 ESR信号宽度主要由应变引起的以g为单位的高斯扩展引起的不均匀展宽所致,从而导致依赖于频率(v)的峰到峰展宽△B_(pp)〜(SB)/ v = 0.62 G / GHz对于施加的磁场B // g_3主轴和B // n分别为1.13 G / GHz。与(100)Si / SiO_2中常见的Si Pb型界面缺陷相比,自旋轨道耦合常数比为λ(Ge)/λ(Si)时,增强的(v依赖性扩展尺度)更大。发现未解决的〜(73)Ge超精细相互作用低于〜1.56G,即推断的残余(ν→0)宽度,缺陷的核心(先前描述为Ge P_(b1)型中心)涉及一个不对称的背面键合的三价Ge原子,所有数据的总和表明存在两个Ge和一个Si原子和/或应变键的反向键排列。初步研究表明该缺陷表现出反向的氢钝化/去钝化动力学,其中缺陷可能很大,在H_2中通过加热使ESR失活了一部分,该中心的性质和性质在其固有的结合为界面失配中心的背景下进行了讨论,其中评估缺陷的性质和发生方式可能提供了与解开联系的链接点缺陷在适应界面失配中的作用。

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  • 来源
    《Journal of Applied Physics》 |2012年第7期|p.074501.1-074501.14|共14页
  • 作者单位

    Department of Physics and INPAC-Institute for Nanoscale Physics and Chemistry, University of Leuven,3001 Leuven, Belgium,IMEC, Kapeldreef75, 3001, Leuven, Belgium;

    Department of Physics and INPAC-Institute for Nanoscale Physics and Chemistry, University of Leuven,3001 Leuven, Belgium;

    IMEC, Kapeldreef75, 3001, Leuven, Belgium;

    Department of Physics and INPAC-Institute for Nanoscale Physics and Chemistry, University of Leuven,3001 Leuven, Belgium;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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