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First-principles study of shear behavior of Al, TiN, and coherent Al/TiN interfaces

机译:Al,TiN和相干Al / TiN界面的剪切行为的第一性原理研究

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摘要

In this ab initio work, density functional theory was used to calculate the ideal shear strengths of pure Al, pure TiN, the Al/TiN interfacial region, and Al/TiN multilayers. The ideal shear strength of the Al/TiN interface was found to vary from very low (on the order of the ideal shear strength of Al) to very high (on the order of the ideal shear strength of TiN), depending on whether the TiN at the interface was Ti- or N-terminated, respectively. The results suggest that the shear properties of Al/TiN depend strongly on the chemistry of the interface, A1:N versus Al:Ti terminations. Nevertheless, for the Al/TiN multilayers, the ideal shear strength was limited by shear in the Al layer away from the interface, even when the individual layer thickness is less than a nanometer.
机译:在从头开始的工作中,使用密度泛函理论来计算纯Al,纯TiN,Al / TiN界面区域和Al / TiN多层的理想剪切强度。发现Al / TiN界面的理想剪切强度从非常低(约为Al的理想剪切强度)到非常高(约为TiN的理想剪切强度)之间变化,这取决于TiN是否在界面处分别是Ti或N端基。结果表明,Al / TiN的剪切性能在很大程度上取决于界面的化学性质,即A1:N与Al:Ti终止。然而,对于Al / TiN多层,理想的剪切强度受到Al层中远离界面的剪切的限制,即使单个层的厚度小于纳米也是如此。

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  • 来源
    《Journal of Applied Physics 》 |2012年第8期| p.083505.1-083505.5| 共5页
  • 作者单位

    Materials Science and Technology Division, MST-8, Los Alamos National Laboratory, Los Alamos,New Mexico 87545, USA,Chemical, Materials, and Biomolecular Engineering, Institute of Materials Science,University of Connecticut, Storrs, Connecticut 06269, USA;

    Chemical, Materials, and Biomolecular Engineering, Institute of Materials Science,University of Connecticut, Storrs, Connecticut 06269, USA;

    Materials Physics and Applications Division, MPA-CINT, Los Alamos National Laboratory,Los Alamos, New Mexico 87545, USA;

    Materials Science and Technology Division, MST-8, Los Alamos National Laboratory, Los Alamos,New Mexico 87545, USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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