机译:介电函数和InSb临界点的温度依赖性(通过椭圆偏振光谱法)从31到675 K
Nano-Optical Property Laboratory and Department of Physics, Kyung Hee University, Seoul 130-701,South Korea;
Nano-Optical Property Laboratory and Department of Physics, Kyung Hee University, Seoul 130-701,South Korea;
Nano-Optical Property Laboratory and Department of Physics, Kyung Hee University, Seoul 130-701,South Korea;
Nano-Optical Property Laboratory and Department of Physics, Kyung Hee University, Seoul 130-701,South Korea;
Nano-Optical Property Laboratory and Department of Physics, Kyung Hee University, Seoul 130-701,South Korea;
Nano-Optical Property Laboratory and Department of Physics, Kyung Hee University, Seoul 130-701,South Korea;
Nano-Optical Property Laboratory and Department of Physics, Kyung Hee University, Seoul 130-701,South Korea;
机译:介电函数和InSb临界点的温度依赖性(通过椭圆偏振光谱法)从31到675 K
机译:在31至675 K的温度下,能量为0.74至6.42 eV时InSb的介电函数的解析测定
机译:椭圆偏振光谱法研究弛豫铅酸盐改性的PbSc1 / 2Ta1 / 2O3铁电陶瓷的温度相关介电函数和带间临界点
机译:光谱椭偏和光反射研究单应变和松弛InxGa1-xAs / GaAs外延层的介电功能和临界点跃迁
机译:用于ULSI互连应用的低k电介质的关键特性和可靠性:厚度和温度依赖性。
机译:具有高表面粗糙度的薄膜:使用椭圆偏振光谱仪进行厚度和介电函数分析
机译:介电函数的温度依赖性和α-Sn的临界点从27到350 k