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首页> 外文期刊>Journal of Applied Physics >The effect of a thermal gradient on the electromigration-driven surface morphological stabilization of an epitaxial thin film on a compliant substrate
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The effect of a thermal gradient on the electromigration-driven surface morphological stabilization of an epitaxial thin film on a compliant substrate

机译:热梯度对顺应性基板上外延薄膜的电迁移驱动表面形态稳定的影响

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摘要

We report a theoretical analysis on the surface morphological stability of a coherently strained thin film that has been grown epitaxially on a deformable substrate and is simultaneously subjected to an external electric field and a temperature gradient. Using well justified approximations, we develop a three-dimensional model for the surface morphological evolution of the thin film and conduct a linear stability analysis of the heteroepitaxial film's planar surface state. The effect of the simultaneous action of multiple external fields on the surface diffusional anisotropy tensor is accounted for. Various substrate types are considered, but emphasis is placed on a compliant substrate that has the ability to accommodate elastically some of the misfit strain in the film due to its lattice mismatch with the substrate. We derive the condition for the synergy or competition of the two externally applied fields and determine the optimal alignment of the external fields that minimizes the critical electric field-strength requirement for the stabilization of the planar film surface. We also examine the role of the temperature dependence of the thermophysical properties and show that the criticality condition for planar surface stabilization does not change when the Arrhenius temperature dependence of the surface diffusivity is considered. Our analysis shows that surface electromigration and thermomigration due to the simultaneous action of properly applied and sufficiently strong electric fields and thermal gradients, respectively, can inhibit Stranski-Krastanow-type instabilities and control the onset of island formation on epitaxial film surfaces.
机译:我们报告了一个理论上的分析的相干应变薄膜的表面形态稳定性,该薄膜已在可变形基板上外延生长,并且同时受到外部电场和温度梯度的影响。使用合理的近似值,我们为薄膜的表面形态演化建立了三维模型,并对异质外延膜的平面表面状态进行了线性稳定性分析。考虑了多个外部场的同时作用对表面扩散各向异性张量的影响。考虑了各种类型的基板,但是重点放在柔顺的基板上,该基板具有由于其与基板的晶格失配而能够弹性地容纳膜中某些失配应变的能力。我们得出了两个外部施加场协同或竞争的条件,并确定了外部场的最佳排列,该最佳排列使稳定平面膜表面的临界电场强度要求最小化。我们还检查了热物理性质的温度依赖性的作用,并表明当考虑表面扩散率的阿伦尼乌斯温度依赖性时,平面表面稳定的临界条件不会改变。我们的分析表明,由于适当施加的电场以及足够强的电场和热梯度的同时作用,表面电迁移和热迁移分别可以抑制Stranski-Krastanow型不稳定性,并控制外延膜表面上岛形成的开始。

著录项

  • 来源
    《Journal of Applied Physics》 |2013年第2期|023503.1-023503.13|共13页
  • 作者单位

    Department of Chemical Engineering, University of Massachusetts, Amherst, Massachusetts 01003-9303, USA;

    Department of Chemical Engineering, University of Massachusetts, Amherst, Massachusetts 01003-9303, USA;

    Department of Chemical Engineering, University of Massachusetts, Amherst, Massachusetts 01003-9303, USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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