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Ab initio study on the effect of structural relaxation on the electronic and optical properties of P-doped Si nanocrystals

机译:从头开始研究结构弛豫对P掺杂Si纳米晶体的电子和光学性质的影响

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摘要

In contrast to the conventional doping of bulk silicon (Si), the doping of Si nanocrystals (NCs) that are often smaller than 5 nm in diameter may lead to serious structural changes. Since the electronic and optical properties of Si NCs are intimately associated with their structures, it is critical to understand how doping impacts the structures of Si NCs. By means of ab initio calculation we now compare 1.4 nm phosphorus (P)-doped Si NCs without structural relaxation and those with structural relaxation. Structural changes induced by structural relaxation are manifested by the stretching and compressing of bonds and apparent variations in bond angles. With the increase of the concentration of P structural changes induced by structural relaxation become more serious. It is found that structural relaxation makes differences in the energy-level schemes of P-doped Si NCs. Structural relaxation also causes the binding energy of an electron in a P-doped Si NC to more significantly increase as the concentration of P increases. With the increase of the concentration of P structural relaxation leads to more pronounced changes in the optical absorption of P-doped Si NCs.
机译:与体硅(Si)的常规掺杂相反,直径通常小于5 nm的Si纳米晶体(NC)的掺杂可能导致严重的结构变化。由于Si NC的电子和光学特性与其结构密切相关,因此了解掺杂如何影响Si NC的结构至关重要。通过从头算计算,我们现在比较没有结构弛豫和具有结构弛豫的1.4 nm磷(P)掺杂的Si NCs。由结构松弛引起的结构变化表现为键的拉伸和压缩以及键角的明显变化。随着P浓度的增加,由结构弛豫引起的结构变化变得更加严重。发现结构弛豫使掺P的Si NCs的能级方案有所不同。结构弛豫还导致掺杂P的Si NC中电子的结合能随着P浓度的增加而显着增加。随着P浓度的增加,结构弛豫会导致P掺杂Si NCs的光吸收发生更明显的变化。

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  • 来源
    《Journal of Applied Physics》 |2014年第19期|194304.1-194304.6|共6页
  • 作者单位

    State Key Laboratory of Silicon Materials and Department of Materials Science and Engineering, Zhejiang University, Hangzhou, Zhejiang 310027, China;

    State Key Laboratory of Silicon Materials and Department of Materials Science and Engineering, Zhejiang University, Hangzhou, Zhejiang 310027, China;

    State Key Laboratory of Silicon Materials and Department of Materials Science and Engineering, Zhejiang University, Hangzhou, Zhejiang 310027, China;

    IEMN-Department ISEN, UMR CNRS 8520, Lille 59046, France;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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