机译:用于磁头的耐用超薄氮化硅/碳双层涂层:增强的界面粘合作用
Department of Electrical and Computer Engineering, National University of Singapore, Singapore, Singapore 117583;
Department of Electrical and Computer Engineering, National University of Singapore, Singapore, Singapore 117583;
Institute of Microelectronics (IME), A*STAR (Agency for Science, Technology, and Research), 11 Science Park Road, Singapore Science Park Ⅱ, Singapore, Singapore 117685;
Institute of Materials Research and Engineering (IMRE), A*STAR (Agency for Science, Technology, and Research), 3 Research Link, Singapore, Singapore 117602;
Department of Mechanical Engineering, National University of Singapore, Singapore, Singapore 117575;
Institute of Materials Research and Engineering (IMRE), A*STAR (Agency for Science, Technology, and Research), 3 Research Link, Singapore, Singapore 117602;
Department of Electrical and Computer Engineering, National University of Singapore, Singapore, Singapore 117583;
机译:用于高密度磁存储的超薄(<2 nm)氮化硅/碳双层外涂层的增强的摩擦学,腐蚀和微结构特性
机译:功能性带头上氮化硅/四面体无定形碳双层涂层的极佳磨损寿命
机译:超薄碳与散射石墨烯/富勒烯样纳米结构:高密度磁性储存的耐用保护外涂层
机译:氮化硅/四面体无定形碳双层涂层,可延长功能性磁头的使用寿命
机译:磁硬盘驱动器磁头-磁盘界面处氢化和氮化碳外涂层的摩擦化学研究。
机译:通过过滤阴极真空电弧合成的超薄无定形碳膜用作热辅助磁记录头的保护层
机译:通过过滤的阴极真空弧合成的超薄非晶碳膜用作热辅助磁记录头的保护外涂层