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首页> 外文期刊>Journal of Applied Physics >Analysis of short circuit current loss in rear emitter crystalline Si solar cell
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Analysis of short circuit current loss in rear emitter crystalline Si solar cell

机译:后发射极晶体硅太阳能电池的短路电流损耗分析

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摘要

Short circuit current (J_(sc)) loss in rear emitter crystalline Si solar cell is analyzed in detail by a 2D device simulation and compared with the experimental results. There is a significant loss in J_(sc) for the rear emitter n-Si solar cell with an n-type doped front surface field (FSF) when the base substrate resistivity is low. It is due to an increase in recombination in the FSF region led by a less barrier height for minority carriers with a lower substrate resistivity. The barrier height less than 0.1 eV causes large loss in J_(sc). To achieve higher J_(sc) for the cells with FSF, the control of the doping concentration in FSF, the substrate thickness, and the barrier height for the minority carriers are important. A rear emitter heterojunction Si solar cell with an amorphous Si passivation layer shows no substrate resistivity dependence on J_(sc) since an amorphous Si possess a higher barrier height and a long bulk lifetime of more than a few milliseconds.
机译:通过二维器件仿真,详细分析了后发射极晶体硅太阳能电池的短路电流(J_(sc))损耗,并将其与实验结果进行了比较。当基础衬底的电阻率很低时,对于具有n型掺杂前表面场(FSF)的后发射极n-Si太阳能电池,J_(sc)会有很大损失。这是由于对于具有较低衬底电阻率的少数载流子,由于势垒高度减小而导致FSF区域中的复合增加。势垒高度小于0.1 eV会导致J_(sc)的大损耗。为了获得具有FSF的单元更高的J_(sc),控制FSF中的掺杂浓度,衬底厚度和少数载流子的势垒高度非常重要。具有非晶硅钝化层的后发射极异质结硅太阳能电池没有显示出对J_(sc)的衬底电阻率依赖性,因为非晶硅具有更高的势垒高度和超过几毫秒的长堆积寿命。

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  • 来源
    《Journal of Applied Physics 》 |2016年第20期| 204501.1-204501.9| 共9页
  • 作者单位

    Advanced Technology R&D Center, Mitsubishi Electric Corporation, 8-1-1 Tsukaguchi-Honmachi, Amagasaki 661-8661, Hyogo, Japan;

    Advanced Technology R&D Center, Mitsubishi Electric Corporation, 8-1-1 Tsukaguchi-Honmachi, Amagasaki 661-8661, Hyogo, Japan;

    Advanced Technology R&D Center, Mitsubishi Electric Corporation, 8-1-1 Tsukaguchi-Honmachi, Amagasaki 661-8661, Hyogo, Japan;

    Advanced Technology R&D Center, Mitsubishi Electric Corporation, 8-1-1 Tsukaguchi-Honmachi, Amagasaki 661-8661, Hyogo, Japan;

    Advanced Technology R&D Center, Mitsubishi Electric Corporation, 8-1-1 Tsukaguchi-Honmachi, Amagasaki 661-8661, Hyogo, Japan;

    Advanced Technology R&D Center, Mitsubishi Electric Corporation, 8-1-1 Tsukaguchi-Honmachi, Amagasaki 661-8661, Hyogo, Japan;

    Advanced Technology R&D Center, Mitsubishi Electric Corporation, 8-1-1 Tsukaguchi-Honmachi, Amagasaki 661-8661, Hyogo, Japan;

    Advanced Technology R&D Center, Mitsubishi Electric Corporation, 8-1-1 Tsukaguchi-Honmachi, Amagasaki 661-8661, Hyogo, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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