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Planar Hall effect bridge sensors with NiFe/Cu/IrMn stack optimized for self-field magnetic bead detection

机译:具有NiFe / Cu / IrMn叠层的平面霍尔效应桥式传感器已针对自磁场磁珠检测进行了优化

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摘要

The stack composition in trilayer Planar Hall effect bridge sensors is investigated experimentally to identify the optimal stack for magnetic bead detection using the sensor self-field. The sensors were fabricated using exchange-biased stacks Ni_(80)Fe_(20)(t_(FM))/Cu(t_(Cu))/Mn_(80)Ir_(20)(10nm) with t_(FM)= 10. 20, and 30 nm, and 0 ≤ t_(Cu) ≤ 0.6 nm. The sensors were characterized by magnetic hysteresis measurements, by measurements of the sensor response vs. applied field, and by measurements of the sensor response to a suspension of magnetic beads magnetized by the sensor self-field due to the sensor bias current. The exchange bias field was found to decay exponentially with t_(Cu) and inversely with t_(FM) The reduced exchange field for larger values of t_(FM) and t_(Cu) resulted in higher sensitivities to both magnetic fields and magnetic beads. We argue that the maximum magnetic bead signal is limited by Joule heating of the sensors and, thus, that the magnetic stacks should be compared at constant power consumption. For a fixed sensor geometry, the figure of merit for this comparison is the magnetic field sensitivity normalized by the sensor bias voltage. In this regard, we found that sensors with t_(FM) = 20 nm or 30 nm outperformed those with t_(FM) = 10nm by a factor of approximately two, because the latter have a reduced AMR ratio. Further, the optimum layer thicknesses, t_(Cu)≈0.6nm and t_(FM) = 20-30 nm, gave a 90% higher signal compared to the corresponding sensors with t_(Cu) = 0nm.
机译:实验研究了三层平面霍尔效应桥式传感器中的堆栈组成,以使用传感器自场识别用于磁珠检测的最佳堆栈。传感器是使用交换偏置的Ni_(80)Fe_(20)(t_(FM))/ Cu(t_(Cu))/ Mn_(80)Ir_(20)(10nm)堆叠制作的,其中t_(FM)= 10 20和30 nm,0≤t_(Cu)≤0.6 nm。传感器的特征在于磁滞测量,传感器响应与外加磁场的测量以及传感器对由于传感器偏置电流而被传感器自磁场磁化的磁珠悬浮液的响应。发现交换偏置场随t_(Cu)呈指数衰减,而与t_(FM)成反比。对于较大的t_(FM)和t_(Cu)值,减小的交换场导致对磁场和磁珠的敏感性更高。我们认为最大磁珠信号受传感器的焦耳热限制,因此,应在恒定功耗下比较磁堆。对于固定的传感器几何形状,此比较的优值是通过传感器偏置电压归一化的磁场灵敏度。在这方面,我们发现t_(FM)= 20 nm或30 nm的传感器比t_(FM)= 10nm的传感器性能好大约两倍,因为后者的AMR比降低了。此外,与t_(Cu)= 0nm的相应传感器相比,最佳层厚度t_(Cu)≈0.6nm和t_(FM)= 20-30 nm给出了更高的信号90%。

著录项

  • 来源
    《Journal of Applied Physics》 |2016年第9期|093910.1-093910.8|共8页
  • 作者单位

    Department of Micro- and Nanotechnology, Technical University of Denmark, DTU Nanotech, Building 345 East, DK-2800 Kongens, Lyngby, Denmark;

    Department of Micro- and Nanotechnology, Technical University of Denmark, DTU Nanotech, Building 345 East, DK-2800 Kongens, Lyngby, Denmark;

    Department of Micro- and Nanotechnology, Technical University of Denmark, DTU Nanotech, Building 345 East, DK-2800 Kongens, Lyngby, Denmark;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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