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首页> 外文期刊>Journal of Applied Physics >Unusual anisotropy of inplane field magnetoresistance in ultra-high mobility SiGe/Si/SiGe quantum wells
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Unusual anisotropy of inplane field magnetoresistance in ultra-high mobility SiGe/Si/SiGe quantum wells

机译:超高迁移率SiGe / Si / SiGe量子阱中面内磁场电阻的各向异性

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摘要

We find an unusual anisotropy of the inplane field magnetoresistance with higher resistance in the parallel orientation of the field, B_‖, and current, I, in ultra-high mobility SiGe/Si/SiGe quantum wells. The anisotropy depends on the orientation between the inplane field and the current relative to the crystallographic axes of the sample, and is a consequence of the ridges on the quantum well surface. For the parallel or perpendicular orientations between current and ridges, a method of converting the magnetoresistance measured at I⊥B_‖ into the one measured at I ‖ B_‖ is suggested and is shown to yield results that agree with the experiment.
机译:我们发现在超高迁移率SiGe / Si / SiGe量子阱中,在磁场B_''和电流I的平行方向上,具有更高电阻的平面磁场磁阻具有各向异性。各向异性取决于面内电场和电流相对于样品晶体轴的方向,并且是量子阱表面上的脊的结果。对于电流和脊之间的平行或垂直方向,提出了一种将在I⊥B_”处测得的磁阻转换为在I” B_”处测得的磁阻的方法,该方法显示出与实验一致的结果。

著录项

  • 来源
    《Journal of Applied Physics》 |2017年第22期|224301.1-224301.5|共5页
  • 作者单位

    Institute of Solid State Physics, Chernogolovka, Moscow District 142432, Russia;

    Institute of Solid State Physics, Chernogolovka, Moscow District 142432, Russia;

    Institute of Solid State Physics, Chernogolovka, Moscow District 142432, Russia;

    Department of Electrical Engineering and Graduate Institute of Electronics Engineering, National Taiwan University, Taipei 106, Taiwan and National Nano Device Laboratories, Hsinchu 300, Taiwan;

    Department of Electrical Engineering and Graduate Institute of Electronics Engineering, National Taiwan University, Taipei 106, Taiwan and National Nano Device Laboratories, Hsinchu 300, Taiwan;

    Physics Department, Northeastern University, Boston, Massachusetts 02115, USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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