...
首页> 外文期刊>Journal of Applied Physics >Enhanced photoelectrochemical performance of InGaN-based nanowire photoanodes by optimizing the ionized dopant concentration
【24h】

Enhanced photoelectrochemical performance of InGaN-based nanowire photoanodes by optimizing the ionized dopant concentration

机译:通过优化电离掺杂剂浓度来增强InGaN基纳米线光阳极的光电化学性能

获取原文
获取原文并翻译 | 示例

摘要

InGaN-based nanowires (NWs) have been extensively studied for photoelectrochemical (PEC) water splitting devices owing to their tunable bandgap and good chemical stability. Here, we further investigated the influence of Si doping on the PEC performance of InGaN-based NW photo anodes. The Si dopant concentration was controlled by tuning the Si effusion cell temperature (T-Si) during plasma-assisted molecular beam epitaxy growth and further estimated by Mott-Schottky electrochemical. measurements. The highest Si dopant concentration of 2.1 x 10(18) cm(-3) was achieved at T-Si = 1120 degrees C. and the concentration decreased with further increases in T-Si. The flat band potential was calculated and used to estimate the conduction and valence hand edge potentials of the Si-doped InGaN-based NWs, The band edge potentials were found to seamlessly straddle the redox potentials of water splitting. The linear scan voltammetry results were consistent with the estimated carrier concentration. The InGaN-based NWs doped with Si at T-Si = 1120 degrees C exhibited almost 9 times higher current density than that of the undoped sample and a stoichiometric evolution of hydrogen and oxygen gases. Our systematic findings suggest that the PEC performance can be significantly improved by optimizing the Si doping level of InGaN-based NW photoanodes. (C) 2018 Author(s).
机译:由于InGaN基纳米线(NWs)具有可调节的带隙和良好的化学稳定性,因此已经广泛地用于光电化学(PEC)水分解装置的研究。在这里,我们进一步研究了Si掺杂对InGaN基NW光阳极PEC性能的影响。通过调节等离子体辅助分子束外延生长期间的硅扩散池温度(T-Si)来控制Si掺杂剂浓度,并进一步通过Mott-Schottky电化学方法进行估算。测量。在T-Si = 1120℃下达到2.1×10(18)cm(-3)的最高Si掺杂剂浓度,并且该浓度随着T-Si的进一步增加而降低。计算了平坦的带电势,并将其用于估算掺Si的InGaN基NW的导通和价手边缘电势。发现带边缘电势无缝地跨越了水分解的氧化还原电势。线性扫描伏安法结果与估计的载流子浓度一致。在T-Si = 1120℃下掺有Si的InGaN基NW的电流密度是未掺杂样品的近9倍,并且氢气和氧气的化学计量演变。我们的系统发现表明,通过优化基于InGaN的NW光电阳极的Si掺杂水平,可以显着提高PEC性能。 (C)2018作者。

著录项

  • 来源
    《Journal of Applied Physics 》 |2018年第8期| 083105.1-083105.8| 共8页
  • 作者单位

    KAUST, Photon Lab, Thuwal 239556900, Saudi Arabia;

    KAUST, Photon Lab, Thuwal 239556900, Saudi Arabia;

    KAUST, Photon Lab, Thuwal 239556900, Saudi Arabia;

    KAUST, Photon Lab, Thuwal 239556900, Saudi Arabia;

    KAUST, Photon Lab, Thuwal 239556900, Saudi Arabia;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号