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Pre-coalescence scaling of graphene island sizes

机译:石墨烯岛尺寸的预凝聚缩放

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摘要

Graphene grown using cold-wall chemical vapor deposition on Cu surfaces follows a classical nucleation and growth mechanism. Following nucleation at the earliest growth stages, isolated crystallites grow, impinge, and coalesce to form a continuous layer. During the pre-coalescence growth regime, the size distributions of graphene crystallites exhibit scaling of the form N(s) = theta/ s (2) g(s/ s ), where s is the island area, theta is the graphene coverage, s is the average island area, N is the areal density, and g(x) is a scaling function. For graphene grown on Cu surfaces that have been annealed in a reducing Ar vertical bar H-2 ambient, excellent data collapse onto a universal Avrami scaling function is observed irrespective of graphene coverage, surface roughness, or Cu grain size. This result is interpreted to indicate attachment-limited growth and desorption of diffusing C-containing species. Graphene grown on Cu surfaces that were annealed in a non-reducing environment exhibits a qualitatively different scaling function, indicating diffusion-limited growth with a lower attachment barrier combined with C detachment from the graphene edges. Published by AIP Publishing.
机译:使用冷壁化学气相沉积在Cu表面上生长的石墨烯遵循经典的成核和生长机理。在最早的成核阶段成核后,孤立的微晶生长,撞击并聚结形成连续的层。在预聚结生长过程中,石墨烯微晶的尺寸分布呈N(s)= theta / (2)g(s / )形式的缩放,其中s是岛面积,θ是石墨烯覆盖率是平均岛面积,N是面密度,g(x)是缩放函数。对于生长在已在Ar垂直棒H-2还原环境中退火过的Cu表面上生长的石墨烯,无论石墨烯覆盖率,表面粗糙度或Cu晶粒大小如何,均观察到极好的数据坍塌到通用Avrami缩放函数上。该结果被解释为指示了扩散受限的含碳物质的附着受限的生长和解吸。在非还原性环境中退火的Cu表面上生长的石墨烯在质上表现出不同的缩放功能,这表明扩散受限的生长具有较低的附着势垒以及C从石墨烯边缘脱离。由AIP Publishing发布。

著录项

  • 来源
    《Journal of Applied Physics 》 |2018年第20期| 205306.1-205306.7| 共7页
  • 作者

    Das Shantanu; Drucker Jeff;

  • 作者单位

    Arizona State Univ, Sch Engn Matter Transport & Energy, Dept Mat Sci & Engn, Tempe, AZ 85287 USA;

    Arizona State Univ, Dept Phys, Tempe, AZ 85287 USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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