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Enhancement of the thermoelectric efficiency in a T-shaped quantum dot system in the linear and nonlinear regimes

机译:线性和非线性状态下T形量子点系统中热电效率的提高

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摘要

In the present work, we investigate the thermoelectric properties of a T-shaped double quantum dot system coupled to two metallic leads incorporating the intra-dot Coulomb interaction. We explore the role of the interference effects and Coulomb blockade on the thermoelectric efficiency of the system in the linear and nonlinear regimes. We studied as well the effect of a Van-Hove singularity of the leads density of states (DOS) at the neighborhood of the Fermi energy, a situation that can be obtained using a carbon nanotube, a graphene nano-ribbon or other contacts with one-dimensional properties. The system is studied above the Kondo temperature. The Coulomb blockade of the electronic charges is studied using the Hubbard III approximation, which properly describes the transport properties of this regime. In the linear response, our results show an enhancement of the thermopower and the figure of merit of the system. For a nonlinear situation, we calculate the thermoelectric efficiency and power output, concluding that the T-shaped double quantum dot is an efficient thermoelectric device. Moreover, we demonstrate the great importance of the DOS Van-Hove singularity at the neighborhood of the Fermi energy to obtain a very significant increase in the thermoelectric efficiency of the system. Published by AIP Publishing.
机译:在目前的工作中,我们研究了T型双量子点系统的热电性能,该系统耦合到两个结合了点内库仑相互作用的金属引线。我们探索了线性和非线性状态下干扰效应和库仑阻塞对系统热电效率的影响。我们还研究了费米能量附近状态的引线密度(DOS)的Van-Hove奇异性的影响,这种情况可以通过使用碳纳米管,石墨烯纳米带或其他与一个碳纳米管接触而获得。尺寸特性。在近藤温度以上对系统进行了研究。使用Hubbard III近似法研究了电荷的库仑封锁,该近似法正确地描述了该体系的传输性质。在线性响应中,我们的结果表明,系统的热功率和品质因数得到了提高。对于非线性情况,我们计算出热电效率和功率输出,认为T形双量子点是一种有效的热电设备。此外,我们证明了费米能量附近的DOS Van-Hove奇异性对于获得系统热电效率的显着提高非常重要。由AIP Publishing发布。

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  • 来源
    《Journal of Applied Physics》 |2018年第8期|085706.1-085706.10|共10页
  • 作者单位

    Pontificia Univ Catolica Rio de Janeiro, Dept Fis, Caixa Postal 38071, BR-22452970 Rio De Janeiro, RJ, Brazil;

    Univ Tecn Federico Santa Maria, Dept Fis, Casilla 110V, Valparaiso, Chile;

    Pontificia Univ Catolica Rio de Janeiro, Dept Fis, Caixa Postal 38071, BR-22452970 Rio De Janeiro, RJ, Brazil;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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