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Advances of nitrogen microwave plasma for optical emission spectrometry and applications in elemental analysis: a review

机译:氮微波等离子体用于光学发射光谱法的研究进展及在元素分析中的应用:综述

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摘要

The present review deals with microwave-induced plasma optical emission spectrometry (MIP OES) with focus on MIP sustained by N_2. Advances of MIP OES as an analytical tool and N_2-MIP OES application in elemental analysis are highlighted. The novel microwave inductively coupled atmospheric-pressure plasma (MICAP) is also presented and the N_2-MICAP is discussed. The assertion of MIP OES as an atomic spectrometry technique for elemental analysis occurred mainly due to the development of N_2-MIP generated in a cavity embedded in a narrow width waveguide. The precise location of the cavity as a function of the wavelength associated with the 2450 MHz frequency maximizes the magnetic field and generates H-type excitation almost entirely, and is similar to that occurring in argon inductively coupled plasma (Ar-ICP). Microwave induced plasma optical emission spectrometry based on the use of N_2-MIP is in general more sensitive in terms of detection limit than the flame atomic absorption spectrometry (FAAS) and almost comparable to inductively coupled plasma optical emission spectrometry (ICP OES). Since the introduction of a commercial N_2-MIP OES instrument in the last decade, which allows metals and non-metal determination, applications of the technique for the analysis of samples with different matrices have increased as demonstrated in the present review.
机译:本综述涉及微波诱导的等离子体光发射光谱法(MIP OES),其焦点对N_2维持的MIP。 MIP OES作为分析工具的进步和元素分析中的N_2-MIP OES应用程序被突出显示。还提出了新型微波电感耦合的大气压等离子体(MICAP),并讨论了N_2-MICAP。 MIP OES作为元素分析的原子分析技术的断言主要是由于在嵌入窄宽度波导中的腔中产生的N_2-MIP的开发。腔作为与2450MHz频率相关的波长的函数的精确位置最大化磁场并几乎完全产生H型激发,并且类似于氩气电感耦合等离子体(AR-ICP)中发生的H型激发。微波诱导的等离子体光发射光谱法基于N_2-MIP的使用通常比火焰原子吸收光谱法(FAAS)的检测限呈更敏感,并且与电感耦合等离子体光发射光谱法(ICP OES)几乎相当。由于在过去十年中推出了商业N_2-MIP OES仪器,这允许金属和非金属测定,因此在本综述中所示,该技术用于分析具有不同矩阵的样品的应用。

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  • 来源
    《Journal of Analytical Atomic Spectrometry》 |2020年第10期|2113-2131|共19页
  • 作者单位

    Instituto de Quimica Universidade Federal do Rio Grande do Sul Av. Bento Goncalves 9500 Porto Alegre RS Brazil;

    Instituto de Quimica Universidade Federal do Rio Grande do Sul Av. Bento Goncalves 9500 Porto Alegre RS Brazil;

    Departamento de Quimica Universidade Federal de Santa Maria Av. Roraima 1000 97.105-900 Santa Maria RS Brazil;

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