首页> 外文期刊>Journal of Analytical Atomic Spectrometry >Investigation of the electrical properties of standard and low-gas-flow ICPs using novel probes for the direct measurements of RF voltage and current in the load coil and the corresponding calculation of the ICP power
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Investigation of the electrical properties of standard and low-gas-flow ICPs using novel probes for the direct measurements of RF voltage and current in the load coil and the corresponding calculation of the ICP power

机译:使用新型探头直接测量负载线圈中的RF电压和电流并进行ICP功率的相应计算,研究标准和低流量ICP的电性能

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摘要

New probes for the direct measurement of high radio-frequency (RF) voltage and current in the load coil of an inductively coupled plasma (ICP) are presented. Based on these measurements, a method for the calculation of power in the ICP is developed. Electrical parameters of the ICP are measured for a wide range of operational conditions in a standard ICP torch with wet aerosol introduction. Further, changes of the electrical parameters are monitored when operating the ICP with a very low argon flow rate of only 0.6 L min~(-1) using a so-called "Static High-Sensitivity ICP" (SHIP) torch. Direct measurements with the new RF probes allow following the evolution of plasma properties as a function of time. Noteworthy, it is found that there is a strong correlation between the plasma power and temperature changes in the RF generator itself. Depending on the plasma parameters, the measured plasma power was shown to differ significantly from the applied power (in the vendor software settings).
机译:提出了用于直接测量电感耦合等离子体(ICP)负载线圈中的高射频(RF)电压和电流的新型探头。基于这些测量,开发了一种用于计算ICP中功率的方法。在使用湿气雾剂的标准ICP炬管中,在各种操作条件下测量ICP的电参数。此外,当使用所谓的“静态高灵敏度ICP”(SHIP)炬以非常低的氩气流量仅以0.6 L min〜(-1)操作ICP时,将监控电参数的变化。使用新的RF探头进行直接测量可以跟踪随时间变化的等离子体特性。值得注意的是,发现等离子体功率与RF发生器本身的温度变化之间存在很强的相关性。根据等离子参数,测得的等离子功率显示出与所施加的功率明显不同(在供应商软件设置中)。

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  • 来源
    《Journal of Analytical Atomic Spectrometry》 |2015年第10期|2089-2098|共10页
  • 作者单位

    IFW Dresden, Institute for Complex Materials, P.O. Box 270116, D-01171 Dresden, Germany;

    IFW Dresden, Institute for Complex Materials, P.O. Box 270116, D-01171 Dresden, Germany;

    Ingenieurbuero Dr. Dietrich Birus, Steinsetzerweg 2, D-04442 Zwenkau, Germany;

    University of Siegen, Department of Chemistry & Biology, Adolf-Reichwein-Str. 2, D-57076 Siegen, Germany;

    University of Muenster, Institute of Inorganic and Analytical Chemistry, Corrensstrasse 30, D-48149 Muenster, Germany;

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