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Structural and Physical Property Studies of Amorphous Zn-ln-Sn-O Thin Films

机译:非晶Zn-In-Sn-O薄膜的结构和物理性能研究

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摘要

The structures in amorphous (α-) Zn, Sn co-doped In_2O_3 (ZITO) thin films grown by pulsed laser deposition on glass under varying oxygen pressure or with varying Sn:Zn ratios were determined using X-ray absorption spectroscopy and anomalous X-ray scattering. Typical structures around cations in a-ZITO films are described and compared with crystalline (c-) ZITO films. The results show that the Zn cations are fourfold coordinated with Zn-O bond lengths of 1.98 ± 0.02 A, which is close to that in bulk ZnO. As a consequence, the second coordination shells around Zn contract. At longer distances away from Zn, the structure is commensurate with the averaged structure. The unit volume around In also contracts slightly compared to bulk In_2O_3, whereas the Sn-O bond length is similar to the one in bulk SnO_2. These unique structural characteristics may account for the films' superior thermal stability over amorphous Sn-doped In_2O_3, and suggest that Zn and Sn act as network-forming cations. Like in c-ZITO, coordination numbers (N) around Sn, In, and Zn follow the order N_(sn) > W_(In) > N_(Zn)· Unlike in c-ZITO, where electrical properties change significantly with a slight variation in the Sn: Zn ratio, this variation does not markedly alter the electrical properties, or the local structures, of α-ZITO films. Dramatic changes in the electrical properties occur for films grown under various oxygen pressures, which point to oxygen "defects" as the source of charge carriers.
机译:使用X射线吸收光谱法和X射线反常光谱法确定了通过在不同氧气压力下或以不同Sn:Zn比率在玻璃上进行脉冲激光沉积而生长的非晶(α-)Zn,Sn共掺杂In_2O_3(ZITO)薄膜的结构。射线散射。描述了a-ZITO膜中阳离子周围的典型结构,并将其与晶体(c-)ZITO膜进行了比较。结果表明,Zn阳离子与Zn-O键长为1.98±0.02 A呈四重配位,接近于本体ZnO。结果,第二配位壳围绕锌收缩。距Zn的距离较长时,其结构与平均结构相当。与本体In_2O_3相比,In周围的单位体积也略有收缩,而Sn-O键的长度与本体SnO_2中的键长相似。这些独特的结构特征可能解释了该膜相对于非晶Sn掺杂的In_2O_3优越的热稳定性,并表明Zn和Sn充当网络形成阳离子。像c-ZITO中一样,Sn,In和Zn周围的配位数(N)遵循N_(sn)> W_(In)> N_(Zn)的顺序。与c-ZITO中不同,电特性会发生显着变化Sn:Zn比值的变化,这种变化不会明显改变α-ZITO膜的电性能或局部结构。在各种氧气压力下生长的薄膜的电性能发生了巨大变化,这表明氧气是电荷载体的“缺陷”。

著录项

  • 来源
    《Journal of the American Ceramic Society》 |2012年第11期|3657-3664|共8页
  • 作者单位

    Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208;

    DND-CAT, Northwestern Synchrotron Research Center at Advanced Photon Source, Argonne, Illinois 60439;

    Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208;

    Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208;

    Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208;

    Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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  • 入库时间 2022-08-17 13:38:59

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