Single pulse development of chromium-deposited imprint micro/nano patterns of photo-cured crosslinked resin using a femtosecond pulsed laser

摘要

Exposure to a single pulse generated from a femtosecond pulsed laser for a duration of 100 fs at a wavelength of 800 nm and a laser fluence of 0.31 J cm(-2) resulted in chromium (Cr) deposition on photocured insoluble imprint resin patterns to be ablated selectively; however, Cr deposition on synthetic quartz surfaces was retained. Single-pulse development of Cr-deposited imprint micro/nano patterns occurred at the same laser fluence, independent of the presence of a laser absorbing dye. Laser ablation of the cured resin near the Cr deposition was confirmed by atomic force microscopy. Depth profile analyses confirmed that Cr species were partially embedded in the cured resin underneath the layer of Cr. These results suggest that the mechanism of laser ablation was due to the rapid thermal expansion of resin near the embedded Cr species and deposited Cr layer rather than the multi-photon absorption of the cured resin.