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Use of doping to achieve low contact resistance in bottom-gate top-contact type organic transistor with liquid-crystalline organic semiconductor, Ph-BTBT-10

机译:使用掺杂来实现底栅极顶接触式有机晶体管的低接触电阻,具有液晶有机半导体,pH-BTBT-10

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摘要

We have investigated the characteristics of bottom-gate and top-contact type field effect transistors fabricated with polycrystalline thin films of a liquid-crystalline organic semiconductor, 2-decyl-7-phenyl-benzothienobenzothiophene (Ph-BTBT-10), with a p-type dopant, tetrafluoro-tetracyano-quinodimethane (F-4-TCNQ). We found that the contact resistance between the semiconductor and electrode was reduced from 3.0 k omega cm to 1.2 k omega cm by contact doping with F-4-TCNQ, and to 0.9 k omega cm by subsequent thermal annealing of the films, in which the F-4-TCNQ dopant diffused from the surface to the interior of the Ph-BTBT-10 thin film. In addition, we found that contact-doped and thermally annealed devices showed higher mobility and smaller threshold voltage in short-channel devices compared to pristine devices. We conclude that thermal diffusion of dopants to improve FET performance is an important technique.
机译:我们研究了用P型液晶有机半导体,2-癸基-7-苯基 - 苯并苯并噻吩(pH-BTBT-10)的多晶薄膜制造的底栅和顶部接触式场效应晶体管的特点。 掺杂掺杂剂,四氟四氰基 - 喹喔酮(F-4-TCNQ)。 我们发现,通过用F-4-TCNQ接触掺杂和通过随后的薄膜的热退火,通过接触掺杂,半导体和电极之间的接触电阻从3.0kωcm到1.2kωcm降低至1.2kΩcm。 F-4-TCNQ掺杂剂从表面扩散到pH-BTBT-10薄膜的内部。 另外,与原始装置相比,我们发现接触掺杂和热退火器件在短沟道装置中显示出更高的迁移率和更小的阈值电压。 我们得出结论,掺杂剂的热扩散提高FET性能是一种重要的技术。

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