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Rapid resist ashing by slot-excited atmospheric pressure microwave O_2 plasma

机译:通过槽励磁大气压微波O_2等离子体快速抗蚀灰化

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摘要

Using a slot-type atmospheric-pressure O-2 microwave plasma produced by a travelling microwave and a slot on the waveguide, novolak polymer resist ashing was investigated. An increase of the gas flow speed drastically enhanced the resist ashing rate and a 3?mmin(?1) ashing rate was obtained. The ashing temperature was measured and a low sample temperature of less than 400K was confirmed. The result suggests the capability of producing very high ashing speeds under atmospheric pressure and low substrate temperatures using atmospheric pressure microwave O-2 plasma.
机译:使用由行进微波产生的槽型大气压O-2微波等离子体和波导上的槽,研究了酚醛清漆聚合物抗蚀剂灰化。气流速度的增加大大提高了抗蚀剂灰化速率,并且获得了3?毫米(α1)灰化率。测量灰化温度并确认低于400K的低样品温度。结果表明,使用大气压微波O-2等离子体在大气压和低基板温度下产生非常高的灰化速度的能力。

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  • 来源
    《Japanese journal of applied physics》 |2019年第12期|126001.1-126001.4|共4页
  • 作者单位

    Nagoya Univ Dept Elect Chikusa Ku Furo Cho Nagoya Aichi 4648603 Japan;

    Nagoya Univ Dept Elect Chikusa Ku Furo Cho Nagoya Aichi 4648603 Japan;

    Nagoya Univ Dept Elect Chikusa Ku Furo Cho Nagoya Aichi 4648603 Japan;

    Nissin Inc 10-7 Kamei Cho Takarazuka Hyogo 6650047 Japan;

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