...
首页> 外文期刊>Japanese Journal of Applied Physics. Part 1, Regular Papers, Brief Communications & Review Papers >Effect of Thermal Annealing on Structural, Electrical, and Magnetic Properties of Ag-doped La_(0.67)Ca_(0.33)MnO_3 Thin Films Grown on LaAlO_3 Substrates
【24h】

Effect of Thermal Annealing on Structural, Electrical, and Magnetic Properties of Ag-doped La_(0.67)Ca_(0.33)MnO_3 Thin Films Grown on LaAlO_3 Substrates

机译:热退火对在LaAlO_3衬底上生长的Ag掺杂La_(0.67)Ca_(0.33)MnO_3薄膜的结构,电和磁性能的影响

获取原文
获取原文并翻译 | 示例
   

获取外文期刊封面封底 >>

       

摘要

Resistance as a function of temperature showed that the metal-insulator transition temperatures of as-grown and annealed Ag-doped La_(0.67)Ca_(0.33)MnO_3 thin films were 235 and 300 K, respectively, and that the metal-insulator transition ranges of these films were relatively narrow, indicative of a sharp phase transition. The temperature coefficient of resistance was as high as 8% at 276 K. The magnetoresistance ratio of the annealed Ag-doped film under a magnetic field of 5 T was approximately 55% at 285 K.
机译:电阻与温度的关系表明,生长和退火后的掺Ag的La_(0.67)Ca_(0.33)MnO_3薄膜的金属-绝缘体转变温度分别为235和300 K,并且金属-绝缘体的转变范围这些薄膜中的一半相对较窄,表明存在急剧的相变。电阻的温度系数在276 K时高达8%。退火的Ag掺杂的薄膜在5 T的磁场下在285 K下的磁阻比约为55%。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号