Nanoimprinting Using Ni Molds Prepared from Highly Ordered Anodic Porous Alumina Templates

摘要

Large-sized Ni molds having patterns of less than 100 nm period were fabricated from naturally ordered anodic porous alumina as a template. The obtained Ni molds could be applied to the nanoimprinting of photopolymerized polymers. An ordered hole array structure of polymer was generated by nanoimprinting using the Ni molds. The hole period of the polymer nanohole arrays could be controlled by changing the geometrical structure of the anodic porous alumina template.