首页> 外文期刊>Japanese Journal of Applied Physics. Part 2, Letters & Express Letters >Observation of Magnetization Reversal Process in Ni-Fe Nanowire Using Magnetic Field Sweeping-Magnetic Force Microscopy
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Observation of Magnetization Reversal Process in Ni-Fe Nanowire Using Magnetic Field Sweeping-Magnetic Force Microscopy

机译:磁场扫描-磁力显微镜观察镍铁纳米线中的磁化反转过程

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摘要

The details of the magnetization reversal process of Ni-Fe nanowires, which were 10, 30, and 50-nm thick, were successfully observed using our newly proposed magnetization measurement method, namely, magnetic field sweeping (MFS)-magnetic force microscopy (MFM). All the points within the nanowire show marked phase changes (stray fields change) as the magnetic field is varied. In particular, each nanowire edge displays a hysteresis loop, while the center shows a sharp jump or a plateau area. These results demonstrate that domain wall motion is dominant in the magnetization reversal process of a 10-nm-thick Ni-Fe nanowire and that domain wall motion along with domain wall pinning play important roles in the magnetization reversal process in both 30- and 50-nm-thick Ni-Fe nanowires.
机译:使用我们新提出的磁化测量方法,即磁场扫描(MFS)-磁力显微镜(MFM),成功观察到了10、30和50 nm厚的Ni-Fe纳米线的磁化反转过程的细节。 )。随着磁场的变化,纳米线内的所有点都显示出明显的相位变化(杂散场变化)。特别地,每个纳米线边缘都显示出磁滞回线,而中心显示出急剧的跃迁或平稳区域。这些结果表明,畴壁运动在10 nm厚的Ni-Fe纳米线的磁化反转过程中占主导地位,并且畴壁运动和畴壁钉扎在30-和50-纳米厚的镍铁纳米线。

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