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首页> 外文期刊>Japanese journal of applied physics >Crystal Structures and Electrical Properties of Epitaxial BiFeO_3 Thin Films with (001), (110), and (111) Orientations
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Crystal Structures and Electrical Properties of Epitaxial BiFeO_3 Thin Films with (001), (110), and (111) Orientations

机译:(001),(110)和(111)取向的外延BiFeO_3薄膜的晶体结构和电性能

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摘要

BiFeO_3 (BFO) films were formed on (001), (110), and (111) La-doped SrTiO_3 single-crystal substrates. All the films were epitaxially grown and had mainly rhombohedral structure. The BFO film formed on the (001) substrate had only a (001) component whereas the BFO films on (110) and (111) substrates had (110) and (111) components, respectively. The (001), (110), and (111) epitaxial BFO films showed the remanent polarizations of 63, 84, and 106μC/cm~2, respectively. It seems that the (110) and (111) components were changed to (110) and (111) ones, respectively, by applying an external voltage. The (001) epitaxial BFO film showed marked asymmetry in its electrical properties. It was found that the (001) epitaxial BFO film had a thin tetragonal layer with spontaneous polarization fixed in the downward direction near the substrate. Finally, we concluded that this tetragonal layer caused the accumulation of space charges at the interface, causing a downward built-in field to be generated. The downward build-in field facilitated the switching of upward polarization and caused asymmetric relaxation.
机译:在(001),(110)和(111)La掺杂SrTiO_3单晶衬底上形成BiFeO_3(BFO)膜。所有的薄膜都外延生长并且主要具有菱形结构。在(001)基板上形成的BFO膜仅具有(001)成分,而在(110)基板和(111)基板上的BFO膜分别具有(110)成分和(111)成分。 (001),(110)和(111)外延BFO膜的剩余极化分别为63、84和106μC/ cm〜2。似乎通过施加外部电压将(110)和(111)分量分别更改为(110)和(111)分量。 (001)外延BFO膜在其电性能上显示出明显的不对称性。发现(001)外延BFO膜具有薄的四方层,其自发极化在向下方向上固定在基板附近。最后,我们得出结论,该四方层导致界面处的空间电荷积累,从而导致生成向下的内置场。向下的内置磁场促进了向上极化的切换,并导致不对称松弛。

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  • 来源
    《Japanese journal of applied physics》 |2010年第9issue2期|p.09MB03.1-09MB03.6|共6页
  • 作者单位

    Tokyo University of Science, Department of Applied Physics, 1-3 Kagurazaka, Shinjuku, Tokyo 162-8601, Japan;

    Tohoku University, Department of Applied Physics, 6-6-05 Aoba, Aramaki, Aoba, Sendai 980-8579, Japan;

    Tohoku University, Department of Instrumental Analysis, 6-6-11 Aoba, Aramaki, Aoba, Sendai 980-8579, Japan;

    rnTokyo University of Science, Department of Applied Physics, 1-3 Kagurazaka, Shinjuku, Tokyo 162-8601, Japan;

    rnTokyo University of Science, Department of Applied Physics, 1-3 Kagurazaka, Shinjuku, Tokyo 162-8601, Japan;

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