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首页> 外文期刊>Japanese journal of applied physics >Improvements of Indium Tin Oxide Film Deposited on Poly(ethylene terephthalate) Substrates by Plasma-Polymerized Hydrogenated Silicon-Carbon-Oxide Buffer Layer
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Improvements of Indium Tin Oxide Film Deposited on Poly(ethylene terephthalate) Substrates by Plasma-Polymerized Hydrogenated Silicon-Carbon-Oxide Buffer Layer

机译:等离子体聚合氢化硅碳氧化物缓冲层对沉积在聚对苯二甲酸乙二醇酯基板上的铟锡氧化物膜的改进

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摘要

A plasma-polymerized hydrogenated silicon-carbon-oxide (Si-C-O:H) buffer layer was interlaid for improving durability of indium tin oxide (ITO) films on poly(ethylene terephthalate) (PET) substrates. It was demonstrated that this buffer layer efficiently improves the durability of specimens under static and dynamic mechanical bending. Experimental results show that the Si-C-O:H buffer layer only negligibly affects the optical transmission and electrical resistivity of coated specimens. The static bending test revealed that the critical radius of curvature (R_c) is 16.0 mm while it is 22.1 mm for the ITO-coated PET with and without buffer layer. The dynamic bending test at curvature radius of 17.7 mm showed that the ITO-coated PET specimen with buffer layer can tolerate more than 2000 cycles, whereas it is less than 200 cycles without buffer layer. The Si-C-O:H buffer layer can significantly reduce the stress in ITO films during bending and therefore improve the bending durability of ITO films.
机译:插入等离子体聚合的氢化硅碳氧化物(Si-C-O:H)缓冲层,以提高聚对苯二甲酸乙二醇酯(PET)基板上的铟锡氧化物(ITO)膜的耐久性。结果表明,该缓冲层有效地提高了样品在静态和动态机械弯曲下的耐久性。实验结果表明,Si-C-O:H缓冲层对涂层样品的透光率和电阻率的影响可忽略不计。静态弯曲测试显示,临界曲率半径(R_c)为16.0 mm,而有和没有缓冲层的ITO涂层PET的临界曲率半径(R_c)为22.1 mm。曲率半径为17.7 mm的动态弯曲试验表明,带缓冲层的ITO涂层PET样品可以承受2000次以上的循环,而没有缓冲层的情况下小于200次循环。 Si-C-O:H缓冲层可以显着降低弯曲期间ITO膜中的应力,因此提高了ITO膜的弯曲耐久性。

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  • 来源
    《Japanese journal of applied physics 》 |2010年第5issue2期| P.05EA07.1-05EA07.5| 共5页
  • 作者单位

    Department of Materials Science and Engineering, Feng Chia University, 100 Wenhwa Rd., Seatwen, Taichung, 40724, Taiwan;

    rnDepartment of Materials Science and Engineering, Feng Chia University, 100 Wenhwa Rd., Seatwen, Taichung, 40724, Taiwan;

    rnDepartment of Materials Science and Engineering, Feng Chia University, 100 Wenhwa Rd., Seatwen, Taichung, 40724, Taiwan;

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