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首页> 外文期刊>Japanese journal of applied physics >Development of Liquid Crystal Display Panel Integrated with Drivers Using Amorphous In-Ga-Zn-Oxide Thin Film Transistors
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Development of Liquid Crystal Display Panel Integrated with Drivers Using Amorphous In-Ga-Zn-Oxide Thin Film Transistors

机译:利用非晶态In-Ga-Zn-氧化物薄膜晶体管与驱动器集成的液晶显示面板的开发

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摘要

We designed, prototyped, and evaluated a liquid crystal panel integrated with a gate driver and a source driver using amorphous In-Ga-Zn-oxide thin film transistors (TFTs). Using bottom-gate bottom-contact (BGBC) thin film transistors, superior characteristics could be obtained. We obtained TFT characteristics with little variation even when the thickness of the gate insulator (GI) film was reduced owing to etching of source/ drain (S/D) wiring, which is a typical process for the BGBC TFT. Moreover, a favorable ON-state current was obtained even when an In-Ga-Zn-oxide layer was formed over the S/D electrode. Since the upper portion of the In-Ga-Zn-oxide layer is not etched, the BGBC structure is predicted to be effective in thinning the In-Ga-Zn-oxide layer in the future. Upon evaluation, we found that the prototyped liquid crystal panel integrated with the gate and source drivers using the TFTs with improved characteristics had stable drive.
机译:我们使用非晶In-Ga-Zn-氧化物薄膜晶体管(TFT)设计,原型化和评估了集成有栅极驱动器和源极驱动器的液晶面板。使用底栅底接触(BGBC)薄膜晶体管,可以获得优异的特性。即使由于源极/漏极(S / D)布线的蚀刻而减小了栅极绝缘体(GI)膜的厚度,我们也获得了几乎不变的TFT特性,这是BGBC TFT的典型工艺。此外,即使在S / D电极上形成In-Ga-Zn-氧化物层时,也可获得良好的导通状态电流。由于未蚀刻In-Ga-Zn-氧化物层的上部,因此预计将来BGBC结构可有效地减薄In-Ga-Zn-氧化物层。经过评估,我们发现,使用性能改进的TFT与栅极和源极驱动器集成的原型液晶面板具有稳定的驱动。

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  • 来源
    《Japanese journal of applied physics》 |2010年第3issue2期|p.03CC02.1-03CC02.4|共4页
  • 作者单位

    Semiconductor Energy Laboratory Co., Ltd., 398 Hase, Atsugi, Kanagawa 243-0036, Japan;

    rnSemiconductor Energy Laboratory Co., Ltd., 398 Hase, Atsugi, Kanagawa 243-0036, Japan;

    rnSemiconductor Energy Laboratory Co., Ltd., 398 Hase, Atsugi, Kanagawa 243-0036, Japan;

    rnSemiconductor Energy Laboratory Co., Ltd., 398 Hase, Atsugi, Kanagawa 243-0036, Japan;

    rnSemiconductor Energy Laboratory Co., Ltd., 398 Hase, Atsugi, Kanagawa 243-0036, Japan;

    rnSemiconductor Energy Laboratory Co., Ltd., 398 Hase, Atsugi, Kanagawa 243-0036, Japan;

    rnSemiconductor Energy Laboratory Co., Ltd., 398 Hase, Atsugi, Kanagawa 243-0036, Japan;

    rnSemiconductor Energy Laboratory Co., Ltd., 398 Hase, Atsugi, Kanagawa 243-0036, Japan;

    rnSemiconductor Energy Laboratory Co., Ltd., 398 Hase, Atsugi, Kanagawa 243-0036, Japan;

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