Fabrication of Self-Ordered Nanoporous Alumina with 69-115 nm Interpore Distances in Sulfuric/Oxalic Acid Mixtures by Hard Anodization

摘要

Well-ordered nanoporous arrays have been obtained using hard anodization of aluminium in oxalic/sulfuric mixture. Various ordered nanoporous alumina films with pore intervals from 69 to 115 nm were fabricated on aluminum by high current anodization approach with various sulfuric concentrations in the oxalic/sulfuric mixture electrolyte under 36-60 V. The sulfuric acid concentration was changed from 0.06 to 0.2 M. Different configurations of the current-time curve are seen to influence the self-ordering of the nanohole arrays. A current density-time curve with exponential oscillating decay configuration is seen to damage the self-ordered array of the nanopores while those with exponential decay under certain conditions cause ordered nanopore arrays. For each electrolyte mixture, the interpore distance was dependent upon the anodization voltages with proportionality constants of almost 2 nm V~(-1). The porosity of the samples (about 3.5%) follows the porosity rule of HA. Final anodization and increasing voltage rate (r_(in)) as a function of sulfuric acid concentration are the main sources to influence the self-ordering of the samples.