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首页> 外文期刊>Japanese journal of applied physics >Energy Band Control of GaAsSb-Based Backward Diodes to Improve Sensitivity of Mi Mi meter-Wave Detection
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Energy Band Control of GaAsSb-Based Backward Diodes to Improve Sensitivity of Mi Mi meter-Wave Detection

机译:基于GaAsSb的后向二极管的能带控制,以提高Mi Mi米波检测的灵敏度

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摘要

The effect of energy band control with varying carrier concentration in GaAsSb-based backward diodes was investigated and diode parameters were analyzed to enhance voltage sensitivity. The backward diodes consisted of a heterojunction of p-GaAs_(0.51)Sb_(0.49)/i-In_(0.52)Al_(0.48)As-ln_(0.63)Ga_(0.37)As-In_(0.53)Ga_(0.47)As, and they were mostly lattice-matched to an InP substrate. The degree of energy band bending at the depletion layer in n-ln_(0.63)Ga_(0.37)As was varied on the basis of the carrier concentration in the n-ln_(0.53)Ga_(0.47)band control layer. Voltage sensitivity depends on carrier concentration since the concentration affects the band bending structure at the junction. The parameter analysis indicated that junction capacitance decreased when the carrier concentration in the band control layer decreased. When the carrier concentration in the band control layer was as low as 5 × 10~(18)cm~(-3), with the diode mesa at a diameter of 2.0μm, an unmatched voltage sensitivity of 1495 V/W was obtained.
机译:研究了基于GaAsSb的后向二极管中随着载流子浓度变化而进行的能带控制的效果,并分析了二极管参数以提高电压灵敏度。后向二极管由p-GaAs_(0.51)Sb_(0.49)/ i-In_(0.52)Al_(0.48)As / n-In_(0.63)Ga_(0.37)As / n-In_(0.53)Ga_的异质结组成(0.47)As,并且它们大多数与InP衬底晶格匹配。 n-ln_(0.63)Ga_(0.37)As中的耗尽层处的能带弯曲程度根据n-ln_(0.53)Ga_(0.47)带控制层中的载流子浓度而变化。电压灵敏度取决于载流子浓度,因为浓度会影响结处的能带弯曲结构。参数分析表明,当带控制层中的载流子浓度降低时,结电容减小。当带控制层中的载流子浓度低至5×10〜(18)cm〜(-3)时,二极管台面直径为2.0μm,可获得无与伦比的电压灵敏度1495 V / W。

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  • 来源
    《Japanese journal of applied physics》 |2010年第10期|p.104101.1-104101.6|共6页
  • 作者单位

    Device and Materials Laboratories, Fujitsu Laboratories Ltd., 10-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0197, Japan;

    Device and Materials Laboratories, Fujitsu Laboratories Ltd., 10-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0197, Japan;

    Device and Materials Laboratories, Fujitsu Laboratories Ltd., 10-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0197, Japan;

    Device and Materials Laboratories, Fujitsu Laboratories Ltd., 10-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0197, Japan;

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