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首页> 外文期刊>Japanese journal of applied physics >Simple Fabrication Technique for Field-Effect Transistor Array Using As-Grown Single-Walled Carbon Nanotubes
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Simple Fabrication Technique for Field-Effect Transistor Array Using As-Grown Single-Walled Carbon Nanotubes

机译:使用生长的单壁碳纳米管的场效应晶体管阵列的简单制造技术

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摘要

A carbon nanotube field-effect transistor (CNT-FET) is a promising candidate for future electronic devices; however, its fabrication process is still challenging. We propose a simple fabrication technique for CNT-FET arrays using as-grown single-walled CNTs (SWNTs) as the gate channel. In this study, a hydrophobic self-assembled monolayer (SAM) was used to restrict the catalyst-supporting area after the fabrication of an electrode array. Since it is known that droplets are trapped at rough edges of a hydrophobic surface, the deposition of a liquid-based catalyst, followed by alcohol catalytic chemical vapor deposition (ACCVD) produced SWNTs that grew only at the corners of electrode edges. The current-voltage (I-V) characterization of FETs with a 40μm channel width showed that 98% of the fabricated devices were electrically connected and more than 50% were functional FETs (I_(On)/I_(off) > 10~2).
机译:碳纳米管场效应晶体管(CNT-FET)是未来电子设备的有希望的候选者。然而,其制造过程仍然具有挑战性。我们提出了一种简单的制造技术,该技术用于使用生长中的单壁CNT(SWNT)作为栅极沟道的CNT-FET阵列。在这项研究中,疏水性自组装单层(SAM)用于限制电极阵列制造后的催化剂负载面积。由于已知液滴会被捕获在疏水表面的粗糙边缘,因此,液态催化剂的沉积以及随后的醇催化化学气相沉积(ACCVD)产生的SWNT仅在电极边缘的拐角处生长。沟道宽度为40μm的FET的电流-电压(I-V)表征表明,98%的已制造器件已电连接,50%以上是功能性FET(I_(On)/ I_(off)> 10〜2)。

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  • 来源
    《Japanese journal of applied physics 》 |2011年第4issue2期| p.04DN08.1-04DN08.4| 共4页
  • 作者单位

    Department of Mechanical Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo, Tokyo 113-8656, Japan,Department of Electrical Engineering, Tokyo University of Science, 1-3 Kagurazaka, Shinjuku, Tokyo 162-8601, Japan;

    Department of Mechanical Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo, Tokyo 113-8656, Japan,Global Center of Excellence for Mechanical Systems Innovation, The University of Tokyo, 7-3-1 Hongo, Bunkyo, Tokyo 113-8656, Japan;

    Department of Mechanical Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo, Tokyo 113-8656, Japan;

    State Key Laboratory of Optoelectronic Materials and Technologies, School of Physics and Engineering, Sun Yat-Sen University,Guangzhou 510275, China;

    Department of Mechanical Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo, Tokyo 113-8656, Japan;

    Department of Mechanical Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo, Tokyo 113-8656, Japan;

    Department of Electrical Engineering, Tokyo University of Science, 1-3 Kagurazaka, Shinjuku, Tokyo 162-8601, Japan;

    Department of Mechanical Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo, Tokyo 113-8656, Japan;

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