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首页> 外文期刊>Japanese journal of applied physics >Inhomogeneous Barrier Height Analysis of (Ni/Au)-lnAIGaN/GaN Schottky Barrier Diode
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Inhomogeneous Barrier Height Analysis of (Ni/Au)-lnAIGaN/GaN Schottky Barrier Diode

机译:(Ni / Au)-lnAIGaN / GaN肖特基势垒二极管的不均匀势垒高度分析

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摘要

The current-voltage (I-V) characteristics of (Ni/Au)-lnAIGaN/GaN Schottky barrier diode (SBDs) have been measured in the temperature range of 297 to 473 K. Results have been interpreted based on the assumption of Gaussian distribution (GD) of barrier heights (BH) due to BH inhomogeneities at the interface. A modified Richardson plot gives the modified Schottky barrier height (Φ_(BO)) and Richardson constant A~* as 1.41 eV and 26Acm~(-2)K~(-2), respectively. The value of Richardson constant, 26Acm~(-2)K~(-2), is very close to the theoretical value of 29.1 26Acm~(-2)K~(-2). Therefore, the temperature dependence of the forward I-V characteristics of the (Ni/Au)-lnAIGaN/GaN SBDs can be explained based on the thermionic emission mechanism with GD of BHs.
机译:(Ni / Au)-lnAIGaN / GaN肖特基势垒二极管(SBD)的电流-电压(IV)特性已在297至473 K的温度范围内进行了测量。结果是根据高斯分布(GD)的假设进行解释的)由于界面处的BH不均匀性导致的势垒高度(BH))。修改后的理查森图给出修改后的肖特基势垒高度(Φ_(BO))和理查森常数A〜*分别为1.41 eV和26Acm〜(-2)K〜(-2)。理查森常数26Acm〜(-2)K〜(-2)的值非常接近理论值29.1 26Acm〜(-2)K〜(-2)。因此,可以基于具有BHs的GD的热电子发射机理来解释(Ni / Au)-InAIAlGaN / GaN SBD的正向IV特性的温度依赖性。

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  • 来源
    《Japanese journal of applied physics》 |2011年第3issue1期|p.13-15|共3页
  • 作者单位

    Department of Micro and Nanosciences, Aalto University, Micronova, PL 13500, 00076 Aalto, Finland;

    Department of Micro and Nanosciences, Aalto University, Micronova, PL 13500, 00076 Aalto, Finland;

    Department of Micro and Nanosciences, Aalto University, Micronova, PL 13500, 00076 Aalto, Finland;

    Semiconductor Physics Research Center, School of Semiconductor and Chemical Engineering,Chonbuk National University, Chonju 561-756, Republic of Korea;

    Department of Micro and Nanosciences, Aalto University, Micronova, PL 13500, 00076 Aalto, Finland;

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