Modification of Semianalytical Finite Element Model for Radio Frequency Sheaths in Single- and Dual-Frequency Capacitively Coupled Plasmas:II. Effects of Nonuniform Bulk Plasma Density and Charging at Dielectric Surface

摘要

The effects of nonuniform bulk plasma density and charging at dielectric surfaces have been incorporated into our multidimensional, semianalytical rf sheath model for single- and dual-frequency capacitively coupled plasmas based on the finite element method. The present modification allows us more accurate prediction of spatiotemporal distributions of potential and electric field in the sheath, and hence of electron and ion densities. The spatial distributions of the electric field and the potential above a junction of two different metals and those above a metal-dielectric interface obtained using the modified rf sheath model agree very well with measured data referred to in this study. This result proves the validity of our rf sheath model modified in this study.