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Line-Profiles and Translational Temperatures of Pb Atoms in Multi-Micro Hollow Cathode Lamp Measured by Diode Laser Absorption Spectroscopy

机译:二极管激光吸收光谱法测量多微空心阴极灯中铅原子的线轮廓和平移温度

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摘要

The behaviors of Pb and metastable He atoms in the multi-micro hollow cathode lamp (multi-MHCL) at pressures of the order of kPa have been investigated by diode laser absorption spectroscopy. The pressure broadening effect for absorption line-profile was overlapped to Doppler profile and was estimated to be 0.26 MHz/Pa from line-profiles of metastable He atoms in the range from 5 to 10 kPa. The translational temperatures of metastable He atoms decreased from 830 to 410 K with increasing the pressure from 5 to 10 kPa. From line-profiles of Pb atoms, the temperatures and densities of Pb in the multi-MHCL were evaluated to decrease from 820 to 610 K and 9.0 × 10~(11) to 4.6 × 10~(11) cm~(-3) with increasing He pressure from 4.9 to 7.4 kPa, respectively. The Lorentz broadenings was larger than those of He atom and the pressure dependence were estimated to be 0.22 MHz/Pa. The behaviors of emission intensities corresponded with those of atomic densities due to enhancement of sputtering. From these results, the multi-MHCL with line-profile guaranteed has been realized for measuring multi-metallic atom densities precisely.
机译:通过二极管激光吸收光谱法研究了多微空心阴极灯(multi-MHCL)中Pb和亚稳态He原子在kPa量级的压力下的行为。吸收线轮廓的压力展宽效应与多普勒轮廓重叠,并且根据亚稳态He原子的线轮廓在5至10 kPa范围内估计为0.26 MHz / Pa。随着压力从5 kPa增加到10 kPa,亚稳态He原子的平移温度从830 K降低到410K。根据Pb原子的线型图,评估了多MHCL中Pb的温度和密度分别从820 K降至610 K和从9.0×10〜(11)降至4.6×10〜(11)cm〜(-3)将He压力从4.9 kPa分别提高到7.4 kPa。洛伦兹展宽大于氦原子展宽,并且压力依赖性估计为0.22 MHz / Pa。由于溅射的增强,发射强度的行为与原子密度的行为相对应。从这些结果来看,已经实现了具有线轮廓保证的多MHCL,可精确测量多金属原子密度。

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  • 来源
    《Japanese journal of applied physics》 |2012年第8issue1期|p.086301.1-086301.5|共5页
  • 作者单位

    Graduate School of Systems Engineering, Wakayama University, Wakayama 640-8510, Japan;

    Faculty of Science and Technology, Meijo University, Nagoya 468-8502, Japan;

    Graduate School of Systems Engineering, Wakayama University, Wakayama 640-8510, Japan;

    Faculty of Systems Engineering, Wakayama University, Wakayama 640-8510, Japan;

    Faculty of Science and Technology, Meijo University, Nagoya 468-8502, Japan;

    Plasma Center for Industrial Applications, Nagoya Industries Promotion Corporation, Nagoya 463-0003, Japan;

    NU EcoEngineering Co., Ltd., Miyoshi, Aichi 470-0232, Japan;

    Katagiri Engineering Co., Ltd., Yokohama 230-0003, Japan;

    Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan;

    Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan;

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