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首页> 外文期刊>Japanese journal of applied physics >An Integrated Amorphous Silicon Gate Driver Circuit Using Voltage-Controlled Capacitance Modeling for High Definition Television
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An Integrated Amorphous Silicon Gate Driver Circuit Using Voltage-Controlled Capacitance Modeling for High Definition Television

机译:利用压控电容建模的高清电视集成非晶硅栅极驱动器电路

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We have developed the integrated amorphous silicon gate driver circuit using the model extraction technique of the inverted staggered and nonsymmetric amorphous silicon (a-Si) thin film transistor. The relation between capacitance characteristics of hydrogenated a-Si (a-Si:H) integrated transistors and the output signal of the gate driver circuit is analyzed using UTMOST IV ver. 1.6.4.R and SMARTSPICE ver. 3.19.15.C. The accuracy of the simulated gate output signal using voltage-controlled capacitance modeling is verified with measured data. The a-Si gate driver circuit using the proposed (TFT) model increased the accuracy of rising (95.3%) and falling (92%) time, compared to the conventional model. The suggested model extraction technique can be used for bottom gate and asymmetric TFT structures.
机译:我们使用反向交错和非对称非晶硅(a-Si)薄膜晶体管的模型提取技术开发了集成非晶硅栅极驱动器电路。使用UTMOST IV ver分析氢化的a-Si(a-Si:H)集成晶体管的电容特性与栅极驱动器电路的输出信号之间的关系。 1.6.4.R和SMARTSPICE版本。 3.19.15.C.使用电压控制电容建模的模拟栅极输出信号的精度已通过测量数据验证。与传统模型相比,使用建议的(TFT)模型的a-Si栅极驱动器电路提高了上升时间(95.3%)和下降时间(92%)的精度。建议的模型提取技术可用于底栅和非对称TFT结构。

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  • 来源
    《Japanese journal of applied physics 》 |2012年第4issue2期| p.04DE09.1-04DE09.4| 共4页
  • 作者单位

    Panel Technology Department, LG Display, Paju, Gyeonggi 413-811, Korea;

    Panel Technology Department, LG Display, Paju, Gyeonggi 413-811, Korea;

    Panel Technology Department, LG Display, Paju, Gyeonggi 413-811, Korea;

    Panel Technology Department, LG Display, Paju, Gyeonggi 413-811, Korea;

    Panel Technology Department, LG Display, Paju, Gyeonggi 413-811, Korea;

    School of Electronic and Electrical Engineering, Kyungpook National University, Daegu 702-701, Korea;

    School of Electronic and Electrical Engineering, Kyungpook National University, Daegu 702-701, Korea;

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