...
首页> 外文期刊>Japanese journal of applied physics >Effects of Oxide Seeding Layers on Electrical Properties of Chemical Solution Deposition-Derived Pb(Mg_(1/3)Nb_(2/3))O_3-PbTiO_3 Relaxor Thin Films
【24h】

Effects of Oxide Seeding Layers on Electrical Properties of Chemical Solution Deposition-Derived Pb(Mg_(1/3)Nb_(2/3))O_3-PbTiO_3 Relaxor Thin Films

机译:氧化物籽晶层对化学溶液沉积沉积Pb(Mg_(1/3)Nb_(2/3))O_3-PbTiO_3弛豫薄膜电学性能的影响

获取原文
获取原文并翻译 | 示例
   

获取外文期刊封面封底 >>

       

摘要

Relaxor ferroelectrics Pb(Mg_(1/3)Nb_(2/3))O_3-PbTiO_3 (PMN-PT) have attracted considerable attention because of their excellent electrical properties, such as high dielectricity and piezoelectricity, for application to super capacitors, piezoelectric actuators, and so on. It is well known that the electrical properties of ferroelectric thin films depend on several parameters, such as crystal orientation, composition, and residual stress. In this study, the effects of the lead titanate and lanthanum nickel oxide seeding layers on the film orientation, electrical properties, and low-temperature crystallization behavior were investigated for Chemical Solution Deposition (CSD)-derived PMN-PT thin films. As a result, PMN-PT thin films with (001)_c- and (111)_c-preferred orientations were successfully obtained by designing the seeding layers. Both thin films exhibited very good ferroelectricity because of their good crystallinity and preferred orientation.
机译:弛豫铁电体Pb(Mg_(1/3)Nb_(2/3))O_3-PbTiO_3(PMN-PT)备受关注,因为它们具有优异的电性能,例如高介电性和压电性,可用于超级电容器,压电执行器,等等。众所周知,铁电薄膜的电性能取决于几个参数,例如晶体取向,组成和残余应力。在这项研究中,研究了化学溶液沉积(CSD)衍生的PMN-PT薄膜中钛酸铅和镧镍氧化物的晶种层对薄膜取向,电性能和低温结晶行为的影响。结果,通过设计种子层成功地获得了具有(001)_c-和(111)_c-优选取向的PMN-PT薄膜。由于它们的良好结晶性和优选的取向,两个薄膜都表现出非常好的铁电性。

著录项

  • 来源
    《Japanese journal of applied physics》 |2013年第9issue2期|09KA07.1-09KA07.4|共4页
  • 作者单位

    Graduate School of Engineering, Shizuoka University, Hamamatsu 432-8561, Japan;

    Graduate School of Engineering, Shizuoka University, Hamamatsu 432-8561, Japan;

    Department of Materials Science, Kitami Institute of Technology, Kitami, Hokkaido 090-8507, Japan;

    Research Institute of Electronics, Shizuoka University, Hamamatsu 432-8561, Japan;

    Department of Materials Science, Kitami Institute of Technology, Kitami, Hokkaido 090-8507, Japan;

    Department of Materials Science, Kitami Institute of Technology, Kitami, Hokkaido 090-8507, Japan;

    Research Institute of Electronics, Shizuoka University, Hamamatsu 432-8561, Japan;

    Research Institute of Electronics, Shizuoka University, Hamamatsu 432-8561, Japan;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号