首页> 外文OA文献 >Compositionally modulated $Pbleft(Mg_{rac{1}{3}}Nb_{rac{2}{3}}ight) O_3-xPbTiO_3$ relaxor thin films deposited by pulsed excimer laser ablation technique
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Compositionally modulated $Pbleft(Mg_{rac{1}{3}}Nb_{rac{2}{3}}ight) O_3-xPbTiO_3$ relaxor thin films deposited by pulsed excimer laser ablation technique

机译:成分调制的$ Pb left(Mg _ { frac {1} {3}} Nb _ { frac {2} {3}} right)通过脉冲受激准分子激光烧蚀技术沉积的O_3-xPbTiO_3 $弛豫薄膜

摘要

Thin films of $[(1-x)Pbleft(Mg_{rac{1}{3}}Nb_{rac{2}{3}}ight)O_ 3-xPbTiO_3] (x = 0.1 to 0.3)$ (PMN-PT) were deposited on the platinum coated silicon substrate by pulsed excimer laser ablation technique. A template layer of $LaSr_{0.5}Co_{0.5}O_3$ (LSCO) was deposited on platinum substrate prior to the deposition of PMN-PT thin films. The composition and the structure of the films were modulated via proper variation of the deposition parameter such as substrate temperature, laser fluence and thickness of the template layers. We observed the impact of the thickness of LSCO template layer on the orientation of the films. A room temperature dielectric constant varying from 2000 to 4500 was noted for different composition of the films. The dielectric properties of the films were studied over the frequency range of 100 Hz - 100 kHz over a wide range of temperatures. The films exhibited the relaxor-type behavior that was characterized by the frequency dispersion of the temperature of dielectric constant maxima $(T_m)$ and also diffuse phase transition.
机译:$ [(1-x)Pb left(Mg _ { frac {1} {3}} Nb _ { frac {2} {3}} right)的薄膜O_ 3-xPbTiO_3 ](x = 0.1通过脉冲受激准分子激光烧蚀技术在铜涂覆的硅衬底上沉积约0.3-0.3%的(PMN-PT)。在沉积PMN-PT薄膜之前,将$ LaSr_ {0.5} Co_ {0.5} O_3 $(LSCO)的模板层沉积在铂基板上。通过适当改变沉积参数,例如衬底温度,激光通量和模板层的厚度,来调节膜的组成和结构。我们观察到了LSCO模板层厚度对薄膜取向的影响。对于膜的不同组成,注意到室温介电常数在2000至4500之间变化。在很宽的温度范围内,在100 Hz-100 kHz的频率范围内研究了薄膜的介电性能。薄膜表现出弛豫型行为,其特征在于介电常数最大值$(T_m)$的温度在频率上的频散以及扩散相变。

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