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Chemical Etching Using KOH Aqueous Solution for Corona-Charge Micropatterning of Soda-Lime Glass

机译:使用KOH水溶液进行化学蚀刻以实现钠钙玻璃的电晕电荷微图案化

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摘要

The selectivity of chemical etching for a soda-lime glass substrate to which a micropattemed electric field is applied by corona-charging treatment was investigated. A grating pattern with a period of 4(im was transferred in a soda-lime glass substrate via corona-charging treatment with a mask template. A diffraction efficiency of 0.02% was detected from the refractive index grating in a template-removed glass substrate. A surface relief grating with a period of 4 urn was fabricated on the glass substrate by selective etching using KOH aqueous solution. The etching rate of the corona-charge-treated domain of the glass substrate was 1.6 times higher than that of normal glass. An enhancement of the etching rate of the glass substrate by the corona-charging treatment occurred up to a depth of approximately 200 nm from the surface. After the surface structural change from the refractive index grating, diffraction efficiency increased to 1.64%, which was 80 times higher than that before chemical etching.
机译:研究了通过电晕充电处理对施加有微图案电场的钠钙玻璃基板进行化学蚀刻的选择性。通过使用掩模模板的电晕充电处理,将周期为4(im)的光栅图案转印到钠钙玻璃衬底中。从去除模板的玻璃衬底中的折射率光栅检测到衍射效率为0.02%。使用KOH水溶液通过选择性刻蚀在玻璃基板上制备了周期为4 urn的表面浮雕光栅,经电晕电荷处理的玻璃基板畴的刻蚀速率是普通玻璃的1.6倍。在距表面约200 nm的深度处,通过电晕充电处理提高了玻璃基板的蚀刻速率,从折射率光栅改变表面结构后,衍射效率提高到1.64%,是80倍高于化学蚀刻之前​​。

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  • 来源
    《Japanese journal of applied physics》 |2013年第3issue1期|036701.1-036701.4|共4页
  • 作者单位

    Department of Computer Science, Kitami Institute of Technology, Kitami, Hokkaido 090-8507, Japan;

    Department of Computer Science, Kitami Institute of Technology, Kitami, Hokkaido 090-8507, Japan;

    Photonics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8565, Japan Center for Optical Research and Education, Utsunomiya University, Utsunomiya 321-8585, Japan;

    Photonics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8565, Japan;

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