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机译:在室温下通过激光烧结由铜微粒浆料制成的铜膜:烧结气氛对形貌和电阻率的影响
Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, Sendai 980-8577, Japan, School of Materials Science and Engineering, Henan Polytechnic University, Jiaozuo 454001, China;
Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, Sendai 980-8577, Japan;
Division of Materials Science and Engineering, Faculty of Engineering, Hokkaido University, Sapporo 060-8628, Japan;
Division of Materials Science and Engineering, Faculty of Engineering, Hokkaido University, Sapporo 060-8628, Japan;
机译:烷基胺稳定的铜细颗粒在低烧结温度下提高铜膜导电性的机理
机译:分解与有机残留对通过低温烧结复合颗粒混合分散体制备的铜膜电阻率的影响
机译:温度,结晶相和基材特性在硫化铜纳米粒子薄膜的强脉冲光烧结中的影响
机译:激光功率对激光烧结铜纳米颗粒浆料特性的影响
机译:通过选择性激光烧结制备用于放电加工的二硼化锆-铜,并模拟等离子体炬的铜阴极腐蚀。
机译:分解和有机残留物对复杂颗粒混合分散体低温烧结制备的铜膜电阻率的影响
机译:分解和有机残留物对复杂颗粒混合分散体的低温烧结制备的铜膜电阻率的影响。