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Fabrication of GaAs/AlAs micro-pillar cavities including low-density InAs quantum dots and their photoluminescence properties

机译:具有低密度InAs量子点的GaAs / AlAs微柱腔的制备及其光致发光性能

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Low-density InAs quantum dots (QDs) were grown by intermittent supply method in molecular beam epitaxy. QD density was controlled in a wide range of 10(6) to 10(9) cm(-2) by in-situ monitoring of RHEED specular-beam intensity. Low-density InAs QDs were embedded into GaAs/AlAs micropillar cavity structure, which was fabricated by anisotropic wet-etching through a conventional photoresist mask. Photoluminescence (PL) spectra of single InAs QD in the micro-cavity were analyzed, and its PL intensity was three times higher than that without the cavity. (C) 2015 The Japan Society of Applied Physics
机译:通过分子束外延中的间歇供应方法生长了低密度InAs量子点(QDs)。通过现场监测RHEED镜面光束强度,将QD密度控制在10(6)至10(9)cm(-2)的较宽范围内。将低密度InAs QD嵌入到GaAs / AlAs微柱腔结构中,该结构是通过常规光致抗蚀剂掩模通过各向异性湿法刻蚀制成的。分析了单个InAs量子点在微腔中的光致发光(PL)光谱,其PL强度是没有腔时的三倍。 (C)2015年日本应用物理学会

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