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首页> 外文期刊>Japanese journal of applied physics >Effects of nitrogen doping on the electrical conductivity and optical absorption of ultrananocrystalline diamond/hydrogenated amorphous carbon films prepared by coaxial arc plasma deposition
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Effects of nitrogen doping on the electrical conductivity and optical absorption of ultrananocrystalline diamond/hydrogenated amorphous carbon films prepared by coaxial arc plasma deposition

机译:氮掺杂对同轴电弧等离子体沉积超纳米晶金刚石/氢化非晶碳膜电导率和光吸收的影响

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摘要

3 at.% nitrogen-doped ultrananocrystalline diamond/hydrogenated amorphous carbon composite (UNCD/a-C: H) films were synthesized by coaxial arc plasma deposition. Optically, the films possess large absorption coefficients of more than 10(5) cm(-1) at photon energies from 3 to 5 eV. The optical band gap was estimated to be 1.28 eV. This value is smaller than that of undoped films, which might be attributable to increased sp(2) fractions. The temperature dependence of the electrical conductivity implies that carrier transport follows a hopping conduction model. Heterojunctions with p-type Si substrates exhibited a typical rectifying action. From the capacitance-voltage characteristics that evidently indicated the expansion of a depletion region into the film side, the built-in potential and carrier concentration were estimated to be 0.51 eV and 7.5 x 10(16) cm(-3), respectively. It was experimentally demonstrated that nitrogen-doped UNCD/a-C: H films are applicable as an n-type semiconductor. (C) 2016 The Japan Society of Applied Physics
机译:通过同轴电弧等离子体沉积合成了3 at。%的氮掺杂超纳米晶金刚石/氢化非晶碳复合材料(UNCD / a-C:H)薄膜。从光学上讲,这些薄膜在3至5 eV的光子能量下具有大于10(5)cm(-1)的大吸收系数。光学带隙估计为1.28 eV。该值小于未掺杂膜的值,这可能归因于sp(2)分数的增加。电导率的温度依赖性意味着载流子传输遵循跳跃传导模型。具有p型硅衬底的异质结表现出典型的整流作用。根据明显表明耗尽区扩展到薄膜侧的电容-电压特性,内置电势和载流子浓度分别估计为0.51 eV和7.5 x 10(16)cm(-3)。实验证明,掺氮的UNCD / a-C:H薄膜可用作n型半导体。 (C)2016年日本应用物理学会

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  • 来源
    《Japanese journal of applied physics》 |2016年第7s2期|07LE01.1-07LE01.4|共4页
  • 作者单位

    Kyushu Univ, Dept Appl Sci Elect & Mat, Kasuga, Fukuoka 8168580, Japan|Aswan Univ, Dept Phys, Fac Sci, Aswan 81528, Egypt;

    Kyushu Inst Technol, Dept Elect & Elect Engn, Kitakyushu, Fukuoka 8048550, Japan;

    Kyushu Univ, Dept Appl Sci Elect & Mat, Kasuga, Fukuoka 8168580, Japan;

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