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首页> 外文期刊>Japanese journal of applied physics >S-parameter characterization and lumped-element modelling of millimeter-wave single-drift impact-ionization avalanche transit-time diode
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S-parameter characterization and lumped-element modelling of millimeter-wave single-drift impact-ionization avalanche transit-time diode

机译:毫米波单漂移碰撞电离雪崩渡越时间二极管的S参数表征和集总建模

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摘要

Five silicon (Si) p(++)-n(-)-n(++) samples were grown at various doping concentrations (1.0 x 10(17) -2.2 x 10(17)cm(-3)) in an n(-) layer by using the reduced-pressure CVD technique. By using these samples, 30 x 2 mu m(2) single-drift (SD) impact-ionization avalanche transit-time (IMPATT) diodes were processed with Si-based monolithic millimeter-wave integrated circuit (SIMMWIC) technology.(1,2)) The samples within a small process window exhibited a large negative differential resistance at approximately the avalanche frequency, as confirmed by small-signal S-parameter characterization. A model based on depletion width was given to explain the conditions for the appearance of the negative differential IMPATT resistance, which is the basis of millimeter-wave amplifier and oscillator applications. Furthermore, a measurement-based small-signal lumped-element model was established to describe the IMPATT functionality from the circuit component aspect. This lumped-element model shows a negative differential resistance within a well-defined range in the given element parameters, which can explain the experimental observations. (C) 2016 The Japan Society of Applied Physics
机译:在不同的掺杂浓度(1.0 x 10(17)-2.2 x 10(17)cm(-3))中生长了五个硅(Si)p(++)-n(-)-n(++)样品通过使用减压CVD技术形成n(-)层。通过使用这些样本,使用基于硅的单片毫米波集成电路(SIMMWIC)技术处理了30 x 2μm(2)单漂移(SD)冲击电离雪崩渡越时间(IMPATT)二极管。(1, 2))在小处理窗口内的样品在大约雪崩频率处表现出较大的负差分电阻,这已通过小信号S参数表征得到了证实。给出了基于耗尽宽度的模型来解释负差分IMPATT电阻出现的条件,这是毫米波放大器和振荡器应用的基础。此外,建立了基于测量的小信号集总元素模型,以从电路组件方面描述IMPATT功能。该集总元素模型在给定的元素参数中的明确定义的范围内显示出负差分电阻,这可以解释实验观察结果。 (C)2016年日本应用物理学会

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  • 来源
    《Japanese journal of applied physics》 |2016年第4s期|04EF03.1-04EF03.6|共6页
  • 作者单位

    Univ Stuttgart, Inst Semicond Engn, D-70569 Stuttgart, Germany;

    IHP Microelect, D-15236 Frankfurt, Oder, Germany;

    Univ Stuttgart, Inst Semicond Engn, D-70569 Stuttgart, Germany;

    Univ Stuttgart, Inst Semicond Engn, D-70569 Stuttgart, Germany;

    Univ Stuttgart, Inst Semicond Engn, D-70569 Stuttgart, Germany;

    Univ Stuttgart, Inst Semicond Engn, D-70569 Stuttgart, Germany;

    Univ Stuttgart, Inst Semicond Engn, D-70569 Stuttgart, Germany;

    Univ Stuttgart, Inst Semicond Engn, D-70569 Stuttgart, Germany;

    Univ Stuttgart, Inst Semicond Engn, D-70569 Stuttgart, Germany;

    Univ Stuttgart, Inst Semicond Engn, D-70569 Stuttgart, Germany;

    IHP Microelect, D-15236 Frankfurt, Oder, Germany|Tech Univ Berlin, D-10623 Berlin, Germany;

    Univ Stuttgart, Inst Semicond Engn, D-70569 Stuttgart, Germany;

    Univ Stuttgart, Inst Semicond Engn, D-70569 Stuttgart, Germany;

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