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Fabrication of top-contact pentacene-based organic thin-film transistors with short channels using two-step SU8/poly(vinyl alcohol) lift-off photolithography process

机译:使用两步SU8 /聚乙烯醇剥离光刻工艺制造短通道的顶部接触并五苯基有机薄膜晶体管

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摘要

We propose a two-step SU8/poly(vinyl alcohol) (PVA) lift-off photolithography scheme for fabricating top-contact pentacene-based organic thin-film transistors (OTFTs) with small channels. The bilayer of PVA and SU8 will not damage the pentacene channel layer in the lift-off photolithography process used in forming the patterned pentacene channel layer and source/drain metal electrodes. We demonstrate a device that not only obtains a 5 mu m short channel length for source/drain metal-electrode patterning but also avoids fringe current resulting from pentacene channel layer patterning. The field-effect mobility and threshold voltage of the pentacene-based OTFTs were changed from 0.29 to 0.12cm(2)V(-1)s(-1) and from -5.74 to -3.19 V by varying the channel length from 50 to 5 mu m, respectively. The proposed scheme is a good candidate for use in the design and fabrication of high-performance short-channel organic electronics. (C) 2016 The Japan Society of Applied Physics
机译:我们提出了两步SU8 /聚乙烯醇(PVA)剥离光刻方案,用于制造具有小通道的顶部接触并五苯有机薄膜晶体管(OTFT)。 PVA和SU8的双层不会在用于形成图案化并五苯沟道层和源/漏金属电极的剥离光刻工艺中损坏并五苯沟道层。我们演示了一种器件,该器件不仅可以为源极/漏极金属电极图案获得5μm的短沟道长度,而且还可以避免并五苯沟道层图案产生的边缘电流。通过将沟道长度从50变为50,将并五苯OTFT的场效应迁移率和阈值电压从0.29更改为0.12cm(2)V(-1)s(-1),从-5.74更改为-3.19 V. 5微米。所提出的方案是用于高性能短通道有机电子器件的设计和制造的良好候选者。 (C)2016年日本应用物理学会

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  • 来源
    《Japanese journal of applied physics》 |2016年第2期|026502.1-026502.5|共5页
  • 作者单位

    Natl Taiwan Univ Sci & Technol, Dept Elect & Comp Engn, Taipei 106, Taiwan|Natl Taiwan Univ Sci & Technol, Grad Inst Electroopt Engn, Taipei 106, Taiwan;

    Natl Taiwan Univ Sci & Technol, Grad Inst Electroopt Engn, Taipei 106, Taiwan;

    Natl Taiwan Univ Sci & Technol, Dept Elect & Comp Engn, Taipei 106, Taiwan;

    Natl Taiwan Univ Sci & Technol, Dept Elect & Comp Engn, Taipei 106, Taiwan;

    Natl Taiwan Univ Sci & Technol, Grad Inst Electroopt Engn, Taipei 106, Taiwan;

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