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首页> 外文期刊>Japanese journal of applied physics >Surface smoothing of indium tin oxide film by laser-induced photochemical etching
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Surface smoothing of indium tin oxide film by laser-induced photochemical etching

机译:激光诱导光化学刻蚀法氧化铟锡薄膜的表面平滑

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摘要

Surface smoothing of indium tin oxide (ITO) film by laser irradiation was demonstrated. The ITO surface was etched by choline radicals, which were activated by laser irradiation at a wavelength of 532nm. The RMS surface roughness was improved from 5.6 to 4.6 nm after 10 min of laser irradiation. We also showed the changes in the surface morphology of the ITO film with various irradiation powers and times. (C) 2017 The Japan Society of Applied Physics
机译:对铟锡氧化物(ITO)膜的激光照射的表面平滑化进行了说明。 ITO表面被胆碱自由基蚀刻,该胆碱自由基通过在532nm波长的激光照射而被激活。激光照射10分钟后,RMS表面粗糙度从5.6纳米提高到4.6纳米。我们还显示了ITO膜表面形貌随各种照射功率和照射时间的变化。 (C)2017日本应用物理学会

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  • 来源
    《Japanese journal of applied physics》 |2017年第12期|128003.1-128003.3|共3页
  • 作者单位

    Korea Inst Sci & Technol, Nanophoton Res Ctr, Seoul 02792, South Korea;

    Korea Inst Sci & Technol, Nanophoton Res Ctr, Seoul 02792, South Korea;

    Korea Inst Sci & Technol, Nanophoton Res Ctr, Seoul 02792, South Korea;

    Korea Inst Sci & Technol, Nanophoton Res Ctr, Seoul 02792, South Korea;

    Univ Seoul, Dept Nano Sci & Technol, Seoul 02504, South Korea;

    Korea Inst Sci & Technol, Nanophoton Res Ctr, Seoul 02792, South Korea;

    Korea Inst Sci & Technol, Nanophoton Res Ctr, Seoul 02792, South Korea;

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