首页> 外文期刊>Japanese journal of applied physics >Fabrication of p-type BaCuSF and n-type In_2O_3:Sn bilayer films and their applications to the back contact of CdS/CdTe solar cells
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Fabrication of p-type BaCuSF and n-type In_2O_3:Sn bilayer films and their applications to the back contact of CdS/CdTe solar cells

机译:p型BaCuSF和n型In_2O_3:Sn双层薄膜的制备及其在CdS / CdTe太阳能电池背接触中的应用

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摘要

For applications to polycrystalline thin-film tandem solar cells, we studied p-type conductive BaCuSF single layer and p-type BaCuSF and n-type In2O3:Sn (ITO) bilayer films. The BaCuSF films were prepared by pulsed laser deposition (PLD), and the ITO films were prepared by RF sputtering. The bilayer film showed ohmic current-voltage characteristic. A tunnel junction between these two layers was successfully fabricated, because p-type BaCuSF and n-type ITO layers had sufficiently high carrier concentrations. The BaCuSF/ITO bilayer films were employed as the back electrodes of CdS/CdTe solar cells. A CdTe solar cell with a 20-nm-thick BaCuSF/a 300-nm-thick ITO bilayer back contact showed a high conversion efficiency of 13.9% (V-OC = 818 mV, J(SC) = 25.2 mA/cm(2), and FF = 0.675), which was higher than that of a CdTe solar cell with a BaCuSF single-layer back contact (11.1%). The efficiency is comparable to that of a CdTe solar cell with a SrCuSeF/ITO bilayer back contact (14.3%). (C) 2018 The Japan Society of Applied Physics
机译:为了应用于多晶薄膜串联太阳能电池,我们研究了p型导电BaCuSF单层和p型BaCuSF以及n型In2O3:Sn(ITO)双层薄膜。 BaCuSF薄膜通过脉冲激光沉积(PLD)制备,ITO薄膜通过RF溅射制备。双层膜显示出欧姆电流-电压特性。由于p型BaCuSF和n型ITO层具有足够高的载流子浓度,因此成功地在这两层之间制造了隧道结。将BaCuSF / ITO双层膜用作CdS / CdTe太阳能电池的背电极。具有20nm厚的BaCuSF / 300nm厚的ITO双层背接触的CdTe太阳能电池显示出13.9%的高转换效率(V-OC = 818 mV,J(SC)= 25.2 mA / cm(2 )和FF ​​= 0.675),高于具有BaCuSF单层背接触的CdTe太阳能电池(11.1%)。效率可与具有SrCuSeF / ITO双层背面接触的CdTe太阳能电池相媲美(14.3%)。 (C)2018日本应用物理学会

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  • 来源
    《Japanese journal of applied physics》 |2018年第8s3期|08RC19.1-08RC19.6|共6页
  • 作者单位

    Ryukoku Univ, Dept Mat Chem, Otsu, Shiga 5202194, Japan;

    Ryukoku Univ, Dept Mat Chem, Otsu, Shiga 5202194, Japan;

    Kisarazu Coll, Natl Inst Technol, Kisarazu, Chiba 2920041, Japan;

    Kisarazu Coll, Natl Inst Technol, Kisarazu, Chiba 2920041, Japan;

    Kisarazu Coll, Natl Inst Technol, Kisarazu, Chiba 2920041, Japan;

    Ryukoku Univ, Dept Mat Chem, Otsu, Shiga 5202194, Japan;

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